Direct chemical vapor deposition of graphene on plasma-etched quartz glass combined with Pt nanoparticles as an independent transparent electrode for non-enzymatic sensing of hydrogen peroxide

Abstract

In this work, chemical vapor deposition (CVD) method-grown graphene on plasma-etched quartz glass supported platinum nanoparticles (PtNPs/eQG) was constructed as an independent transparent electrode for non-enzymatic hydrogen peroxide (H₂O₂) detection. Graphene grown on quartz glass by the CVD method can effectively reduce the wrinkles and pollution caused by traditional transfer methods. The addition of the CF₄ plasma-etched process accelerates the growth rate of graphene on quartz glass. The platinum nanoparticles (PtNPs) prepared by in situ sputtering have favorable dispersibility and maximize exposed active catalytic sites on graphene, providing performance advantages in the application of H₂O₂ detection. The resulting sensor's detection limit (3.3 nM, S/N = 3), detection linear range (10 nM to 80 μM) and response time (less than 2 s) were significantly superior to other graphene supported PtNPs materials in sensing of H₂O₂. In addition, the material preparation method was related to the non-transfer CVD method and in situ sputtering technology, allowing for the creation of independent electrodes without additional electrode modification processes. This primitive material preparation and electrode assembly process were promoted for the application and development of practical H₂O₂ sensors.