Issue 30, 2020

Mass spectrometric analysis of acid-assisted photochemical release of the trimethyl lock system on the monolayers on gold

Abstract

We report the acid-assisted photolysis of the trimethyl lock system which has long been harnessed for a variety of applications such as drug delivery, cellular imaging, enzyme activity assays, and surface patterning. By mass spectrometric analysis, we found that photoinduced intramolecular cyclization and the ensuing release of the pendant groups of the trimethyl lock on the self-assembled monolayers proceeded cleanly in the presence of HCl, to give a high yield.

Graphical abstract: Mass spectrometric analysis of acid-assisted photochemical release of the trimethyl lock system on the monolayers on gold

Supplementary files

Article information

Article type
Paper
Submitted
06 Mar 2020
Accepted
03 May 2020
First published
11 May 2020
This article is Open Access
Creative Commons BY-NC license

RSC Adv., 2020,10, 17914-17917

Mass spectrometric analysis of acid-assisted photochemical release of the trimethyl lock system on the monolayers on gold

G. Yu and W. Yeo, RSC Adv., 2020, 10, 17914 DOI: 10.1039/D0RA02110E

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