Issue 50, 2020, Issue in Progress
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RSC Advances

Heteroleptic manganese compounds as potential precursors for manganese based thin films and nanomaterials†

Sunju Lee,a   Ga Yeon Lee,a   Chang Gyoun Kim,ab   Taek-Mo Chung ORCID logo *ab  and  Bo Keun Park ORCID logo *ab  

* Corresponding authors

a Thin Film Materials Research Center, Korea Research Institute of Chemical Technology (KRICT), 141 Gajeong-Ro, Yuseong-Gu, Daejeon 34114, Republic of Korea
E-mail: tmchung@krict.re.kr, parkbk@krict.re.kr

b Department of Chemical Convergence Materials, University of Science and Technology (UST), 217, Gajeong-Ro, Yuseong-Gu, Deajeon 34113, Republic of Korea

Abstract

Heteroleptic manganese compounds, [Mn(tmhd)(TMEDA)Cl]2 (1), [Mn(tmhd)(dmamp)]2 (2), Mn2(tmhd)2(edpa)2(μ-THF) (3), [Mn(dmampea)(NEt2)]2 (4), and Mn(dmampea)(iPr-MeAMD) (5), were synthesized and characterized. Compound 5 was a volatile liquid. Structural analysis revealed that 1–4 were dimers. Compounds 1 and 3, 2, and 4 had distorted octahedral, distorted trigonal-bipyramidal, and distorted tetrahedral geometries around the Mn centers, respectively. Based on thermogravimetric analysis, the residues of 2 and 3 were expected to be MnO and Mn3O4, respectively. According to thermogravimetric analysis, 4 showed a higher residual value, whereas 5 exhibited a lower value than those expected for manganese nitrides.

Graphical abstract: Heteroleptic manganese compounds as potential precursors for manganese based thin films and nanomaterials

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Article information

DOI
https://doi.org/10.1039/D0RA05225F
Article type
Paper
Submitted
14 Jun 2020
Accepted
03 Aug 2020
First published
11 Aug 2020
This article is Open Access
Creative Commons BY-NC license

RSC Adv., 2020,10, 29659-29667

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Heteroleptic manganese compounds as potential precursors for manganese based thin films and nanomaterials

S. Lee, G. Y. Lee, C. G. Kim, T. Chung and B. K. Park, RSC Adv., 2020, 10, 29659 DOI: 10.1039/D0RA05225F

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