Issue 74, 2021

Facilitated magnesium atom adsorption and surface diffusion kinetics via artificial bismuth-based interphases

Abstract

Robust bismuth-based interphases, comprised of bismuth and bismuth oxides, were developed using galvanic replacement reactions. Facilitated Mg atom adsorption and distinct interfacial Mg atom migration were demonstrated, greatly lowering the electrochemical energy penalty (23 mV for the nucleation process and 69 mV for the growth process at 1.0 mA cm−2).

Graphical abstract: Facilitated magnesium atom adsorption and surface diffusion kinetics via artificial bismuth-based interphases

Supplementary files

Article information

Article type
Communication
Submitted
17 Apr 2021
Accepted
16 Aug 2021
First published
17 Aug 2021

Chem. Commun., 2021,57, 9430-9433

Facilitated magnesium atom adsorption and surface diffusion kinetics via artificial bismuth-based interphases

H. Chu, Z. Zhang, Z. Song, A. Du, S. Dong, G. Li and G. Cui, Chem. Commun., 2021, 57, 9430 DOI: 10.1039/D1CC02048J

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