A new air-stable Si,S-chelating ligand for Ir-catalyzed directed ortho C–H borylation

Abstract

A new air-stable Si,S-chelating ligand has been developed and used in an iridium-catalyzed ortho C–H borylation reaction with a broad substrate scope. This study provides the first example of using a sulfur-containing ligand in the catalytic C–H borylation process. It provides a rapid, efficient, and economical method for the preparation of organoboron compounds.