Issue 46, 2022

Stack-dependent ion diffusion behavior in two-dimensional bilayer C3B

Abstract

In recent years, two-dimensional (2D) C-based materials have been intensively studied due to their excellent physicochemical properties. Meanwhile, extensive research has revealed that the electrical properties of layered materials can be tuned by changing the stacking pattern. However, the tuning of ion diffusion properties through stacking remains to be explored. In this work, bilayer C3B with different stackings as a lithium-ion battery anode material is systematically investigated by first-principles calculations. The calculated results show that bilayer C3B has better electronic properties (with a band gap of 0.44 eV to 0.54 eV) and enhanced bonding strength of Li (−2.82 to −3.27 eV) compared to monolayer C3B. Moreover, the intralayer migration barrier of Li can be regulated by stacking. Interestingly, the AB stacked configuration has the lowest migration barrier of 0.100 eV, which is significantly lower than those of other stacking configurations and monolayer C3B. Further studies revealed that the formation of fast ion diffusion channels in the AB stacked configuration is due to the combined effect of layer distance and in-plane charge transfer. These results offer a new strategy for the regulation of ion diffusion properties in 2D van der Waals materials.

Graphical abstract: Stack-dependent ion diffusion behavior in two-dimensional bilayer C3B

Supplementary files

Article information

Article type
Paper
Submitted
21 Sep 2022
Accepted
07 Nov 2022
First published
08 Nov 2022

Dalton Trans., 2022,51, 17902-17910

Stack-dependent ion diffusion behavior in two-dimensional bilayer C3B

G. Guo, Y. Peng, S. Luo, G. Guo, C. Lai, M. You, X. Xue, Z. Huang, X. Wei, R. Wang and J. Zhong, Dalton Trans., 2022, 51, 17902 DOI: 10.1039/D2DT03070E

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements