Issue 77, 2023
From the journal:

Chemical Communications

Selective edge etching of Pd metallene for enhanced formic acid electrooxidation†

Ze Liu,*ab   Xiaohang Ge,a   Yanrui Wang,a   Mang Niu,a   Weiyong Yuanc  and  Lian Ying Zhang ORCID logo *a  

* Corresponding authors

a Institute of Materials for Energy and Environment, College of Materials Science and Engineering, Qingdao University, Qingdao, P. R. China
E-mail: lyzhang@swu.edu.cn

b Shanghai Institute of Applied Physics, Chinese Academy of Sciences, Shanghai 201800, P. R. China
E-mail: liuze@sinap.ac.cn

c Ningbo Research Institute, Zhejiang University, Ningbo 315100, P. R. China

Abstract

We develop a facile, selective edge etching strategy to create edge sites in Pd metallene using acetic acid. The created edge sites remarkably increase the electrochemically active surface area but reduce the charge transfer resistance, resulting in significant enhancement of catalytic activity and stability toward formic acid oxidation.

Graphical abstract: Selective edge etching of Pd metallene for enhanced formic acid electrooxidation

About
Cited by
Related
Download options Please wait...

Supplementary files

Article information

DOI
https://doi.org/10.1039/D3CC03278G
Article type
Communication
Submitted
07 Jul 2023
Accepted
29 Aug 2023
First published
06 Sep 2023

Chem. Commun., 2023,59, 11588-11591

Permissions

Request permissions

Selective edge etching of Pd metallene for enhanced formic acid electrooxidation

Z. Liu, X. Ge, Y. Wang, M. Niu, W. Yuan and L. Y. Zhang, Chem. Commun., 2023, 59, 11588 DOI: 10.1039/D3CC03278G

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements