Issue 34, 2023
From the journal:

Journal of Materials Chemistry A

Correction: Large-scalable, ultrastable thin films for electromagnetic interference shielding

Jae Seo Park,a   Ji Yong Park,a   Kyunbae Lee,b   Young Shik Cho,c   Hyunji Shin,a   Yeonsu Jung,b   Chong Rae Park, ORCID logo c   Taehoon Kim, ORCID logo *b   Jae Ho Kim ORCID logo *ac  and  Seung Jae Yang ORCID logo *a  

* Corresponding authors

a Department of Chemistry and Chemical Engineering, Education and Research Center for Smart Energy and Materials, Inha University, Incheon 22212, Republic of Korea
E-mail: sjyang@inha.ac.kr

b Composites Research Division, Korea Institute of Materials Science (KIMS), Changwon 51508, Republic of Korea
E-mail: tkim67@kims.re.kr

c Department of Materials Science and Engineering, Seoul National University, Seoul 08826, Republic of Korea
E-mail: advho@snu.ac.kr

Abstract

Correction for ‘Large-scalable, ultrastable thin films for electromagnetic interference shielding’ by Jae Seo Park et al., J. Mater. Chem. A, 2023, https://doi.org/10.1039/D3TA02862C.

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Article information

DOI
https://doi.org/10.1039/D3TA90156D
Article type
Correction
Submitted
24 Jul 2023
Accepted
24 Jul 2023
First published
04 Aug 2023
This article is Open Access
Creative Commons BY license

J. Mater. Chem. A, 2023,11, 18454-18454

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Correction: Large-scalable, ultrastable thin films for electromagnetic interference shielding

J. S. Park, J. Y. Park, K. Lee, Y. S. Cho, H. Shin, Y. Jung, C. R. Park, T. Kim, J. H. Kim and S. J. Yang, J. Mater. Chem. A, 2023, 11, 18454 DOI: 10.1039/D3TA90156D

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