Issue 20, 2024

Primary photodegradation pathways of an exciplex-forming A–D molecular system

Abstract

The photodegradation process of pyrene–(CH2)12–O–(CH2)2-N,N-dimethylaniline (Py-DMA), serving as a model molecular system for exciplex-forming A–D systems, is meticulously examined in solution. The alkyl chain-linker ensures efficient electron transfer between Py and DMA, enabling exciplex formation at concentrations as low as ∼5 μM, free from the interferences dominant in solid-state devices (domain–electrode interface, domain morphological change, accumulation of defects, and so on). The photodegradation mechanism of Py-DMA is proposed for the first time based on chemical identification using steady-state spectroscopy and LC-UV-MS techniques. The mechanism predicts Py-MMA (N-monomethylaniline) and Py-MFA (N-methylformanilide) as primary products and is verified by crosschecking experimental data from FT-IR and 1H NMR, as well as quantum mechanical calculation data. The heavy involvement of molecular oxygen (O2) predicted in the mechanism is confirmed by a series of deoxygenated condition experiments. Although we focus on the two primary photodegradation products, secondary, tertiary, and subsequent photodegradation products are also reported, such as PyOH-MPCA (methylphenylcarbamic acid), Py-FA (formanilide), and even unspecified black carbon precipitates. With recent emerging evidence of a close correlation between the stabilities of optoelectronic devices and their active molecules, the molecular photodegradation pathways of Py-DMA will shed light on the molecular design for exciplex-based optoelectronic devices with longer lifespans.

Graphical abstract: Primary photodegradation pathways of an exciplex-forming A–D molecular system

Supplementary files

Article information

Article type
Paper
Submitted
24 May 2024
Accepted
22 Sep 2024
First published
25 Sep 2024
This article is Open Access
Creative Commons BY-NC license

Mater. Adv., 2024,5, 8254-8264

Primary photodegradation pathways of an exciplex-forming A–D molecular system

Y. Ki, J. Kim, Y. Son, S. Park, W. Chung, T. Kim and H. Lee, Mater. Adv., 2024, 5, 8254 DOI: 10.1039/D4MA00532E

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