Issue 6, 2024

n/p-Doping in a buckled honeycomb InAs monolayer using IVA-group impurities

Abstract

In this work, the effects of n/p-doping on the electronic and magnetic properties of a low-buckled honeycomb InAs monolayer are investigated using first-principles calculations. Herein, IVA-group atoms (C, Si, Ge, Sn, and Pb) are selected as impurities for n-doping in the In sublattice and p-doping in the As sublattice. The pristine monolayer is a semiconductor with a band gap of 0.77(1.41) as determined using the PBE(HSE06) functional. A single In vacancy induces magnetic semiconductor behavior with a large total magnetic moment of 2.98 μB, while a single As vacancy preserves the non-magnetic nature. The monolayer is not magnetized by n-doping with C and Si atoms due to the strong ionic interactions, while the magnetic semiconducting nature is induced with Ge, Sn, and Pb impurities. In these cases, magnetic properties are produced by IVA-group impurities and their neighboring As atoms. Furthermore, either a magnetic semiconducting or half-metallic nature is obtained via p-doping, whereas magnetism originates mainly from C, Si, Ge, and Sn dopants, and the As atoms closest to a Pb dopant. Further investigation indicates that the magnetization becomes stronger upon increasing the doping level, with a total magnetic moment of up to 3.92 μB with 25% Sn impurity. In addition, the thermal stability of the doped systems at room temperature is also confirmed by ab initio molecular-dynamics (AIMD) simulations. The results introduce IVA-group-assisted functionalization as an efficient way to make prospective 2D InAs-based spintronic materials.

Graphical abstract: n/p-Doping in a buckled honeycomb InAs monolayer using IVA-group impurities

Supplementary files

Article information

Article type
Paper
Submitted
10 Jul 2023
Accepted
07 Feb 2024
First published
08 Feb 2024
This article is Open Access
Creative Commons BY-NC license

Nanoscale Adv., 2024,6, 1678-1687

n/p-Doping in a buckled honeycomb InAs monolayer using IVA-group impurities

D. M. Hoat and J. Guerrero-Sanchez, Nanoscale Adv., 2024, 6, 1678 DOI: 10.1039/D3NA00504F

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