Issue 23, 2024

Structural alignment of ZnO columns across multiple monolayer MoS2 layers as compliant substrates

Abstract

Understanding the behavior of materials in multi-dimensional architectures composed of atomically thin two-dimensional (2D) materials and three-dimensional (3D) materials has become mandatory for progress in materials preparation via various epitaxy techniques, such as van der Waals and remote epitaxy methods. We investigated the growth behavior of ZnO on monolayer MoS2 as a model system to study the growth of a 3D material on a 2D material, which is beyond the scope of remote and van der Waals epitaxy. The study revealed column-to-column alignment and inversion of crystallinity, which can be explained by combinatorial epitaxy, grain alignment across an atomically sharp interface, and a compliant substrate. The growth study enabled the formation of a ZnO/MoS2 heterostructure with type-I band alignment. Our findings will have a scientific impact on realizing 2D/3D heterostructures for practical device applications.

Graphical abstract: Structural alignment of ZnO columns across multiple monolayer MoS2 layers as compliant substrates

Supplementary files

Article information

Article type
Paper
Submitted
20 Feb 2024
Accepted
28 Mar 2024
First published
01 Apr 2024
This article is Open Access
Creative Commons BY-NC license

Nanoscale, 2024,16, 11156-11162

Structural alignment of ZnO columns across multiple monolayer MoS2 layers as compliant substrates

X. Wang, K. Kim, B. K. Derby, T. McGuckin, G. A. Calderón, M. T. Pettes, J. Hwang, Y. Kim, J. Park, A. Chen, K. Kang and J. Yoo, Nanoscale, 2024, 16, 11156 DOI: 10.1039/D4NR00724G

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