Nanoscale, surface-confined phase separation by electron beam induced oxidation

Sven Barth; Fabrizio Porrati; Daniel Knez; Felix Jungwirth; Nicolas P. Jochmann; Michael Huth; Robert Winkler; Harald Plank; Isabel Gracia; Carles Cané

doi:10.1039/D4NR01650E

Nanoscale, surface-confined phase separation by electron beam induced oxidation†

Sven Barth,

*^ab Fabrizio Porrati,

^a Daniel Knez,

^c Felix Jungwirth,

^ab Nicolas P. Jochmann,

^ab Michael Huth,

^a Robert Winkler,

^d Harald Plank,

^cd Isabel Gracia^e and Carles Cané^e

Author affiliations

* Corresponding authors

^a Institute of Physics, Goethe University Frankfurt, Max-von-Laue-Str. 1, 60323 Frankfurt am Main, Germany
E-mail: barth@physik.uni-frankfurt.de

^b Institute for Inorganic and Analytical Chemistry, Goethe University Frankfurt, Max-von-Laue-Str. 7, 60438 Frankfurt, Germany

^c Institute of Electron Microscopy and Nanoanalysis, Graz University of Technology, Steyrergasse 17, 8010 Graz, Austria

^d Christian Doppler Laboratory for Direct–Write Fabrication of 3D Nano–Probes (DEFINE), Institute of Electron Microscopy, Graz University of Technology, Steyrergasse 17, 8010 Graz, Austria

^e Institut de Microelectrònica de Barcelona (IMB), Centre Nacional de Microelectrònica (CNM), Consejo Superior de Investigaciones Científicas (CSIC), 08193 Barcelona, Spain

Abstract

Electron-assisted oxidation of Co–Si-based focused electron beam induced deposition (FEBID) materials is shown to form a 2–4 nm metal oxide surface layer on top of an electrically insulating silicon oxide layer less than 10 nm thick. Differences between thermal and electron-induced oxidation on the resulting microstructure are illustrated.

Nanoscale

Nanoscale, surface-confined phase separation by electron beam induced oxidation†

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