Issue 31, 2024

Nanoscale, surface-confined phase separation by electron beam induced oxidation

Abstract

Electron-assisted oxidation of Co–Si-based focused electron beam induced deposition (FEBID) materials is shown to form a 2–4 nm metal oxide surface layer on top of an electrically insulating silicon oxide layer less than 10 nm thick. Differences between thermal and electron-induced oxidation on the resulting microstructure are illustrated.

Graphical abstract: Nanoscale, surface-confined phase separation by electron beam induced oxidation

Supplementary files

Article information

Article type
Communication
Submitted
15 Apr 2024
Accepted
21 Jun 2024
First published
24 Jun 2024
This article is Open Access
Creative Commons BY license

Nanoscale, 2024,16, 14722-14729

Nanoscale, surface-confined phase separation by electron beam induced oxidation

S. Barth, F. Porrati, D. Knez, F. Jungwirth, N. P. Jochmann, M. Huth, R. Winkler, H. Plank, I. Gracia and C. Cané, Nanoscale, 2024, 16, 14722 DOI: 10.1039/D4NR01650E

This article is licensed under a Creative Commons Attribution 3.0 Unported Licence. You can use material from this article in other publications without requesting further permissions from the RSC, provided that the correct acknowledgement is given.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements