Issue 8, 2024

Diminishing the migration resistance of zinc ions by cation vacancy engineering in a spinel-framework

Abstract

The three-dimensional framework structure makes the ZnMn2O4 spinel an excellent host material for zinc ion intercalation and deintercalation processes. However, the high migration energy barrier of zinc ions from the tetrahedron 8a site to the octahedron 16c site in the ZnMn2O4 spinel framework limits its practical application for zinc-ion batteries. The focus of this work is to reduce the migration resistance of zinc ions by constructing cationic zinc vacancies in ZnMn2O4 (named Zn1−xxMn2O4). The reasonable structure adjusted by alkaline etching is conducive to the diffusion of zinc ions. Combining the electrochemical tests and theoretical investigations, it was found that the introduction of zinc vacancies in the Zn1−xxMn2O4 spinel framework caused the diffusion barrier of zinc ions to be reduced by approximately 0.4 eV compared to ZnMn2O4. In addition, the optimal Zn0.650.35Mn2O4 with 35% zinc vacancies was cross-linked by conductive carbon nanotubes (CNTs) to establish an excellent conducting network. The as-prepared Zn0.650.35Mn2O4/CNT composite exhibits a high reversible capacity of 479.3 mA h g−1 at 0.05 A g−1 with a good energy density of 640 W h kg−1 at 28 W kg−1. Our work is to convert the electrochemically poorly active traditional ZnMn2O4 spinel into a functionally active electrode for zinc-ion batteries.

Graphical abstract: Diminishing the migration resistance of zinc ions by cation vacancy engineering in a spinel-framework

Supplementary files

Article information

Article type
Paper
Submitted
02 Dec 2023
Accepted
17 Jan 2024
First published
18 Jan 2024

J. Mater. Chem. A, 2024,12, 4877-4883

Diminishing the migration resistance of zinc ions by cation vacancy engineering in a spinel-framework

J. Yuan, Y. Qiao, Y. Li, H. Xu, W. Zhang, Z. Zhang, G. He and H. Chen, J. Mater. Chem. A, 2024, 12, 4877 DOI: 10.1039/D3TA07451J

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements