Issue 30, 2024

Co-modification of WO3 nanoplates with β-FeOOH/carbon quantum dots combined with plasma treatment enables high-efficiency photoelectrochemical characteristics

Abstract

Dual-modification strategies of conventional WO3 photoanodes are implemented to rationally modulate their photocatalytic activity under irradiation of stimulated sunlight. These are first accomplished by the uniform incorporation of β-FeOOH nanoclusters with WO3 hosts as shell/core heterostructures, followed by argon plasma treatment, which provides synergistic effects for the beneficial transmission and injection of photogenerated holes, including the dramatic increase in oxygen-vacancy mediated active sites due to the in situ formation of Fe2+/Fe3+-coexisting FeOOH facets combined with oxygen-deficient WO3 lattices, and great upward band bending at hybrid photoanode/electrolyte interfaces. Moreover, inspired by naturally existing features, such as nut/scale endowed pine-cone structures, anchoring carbon quantum dots (CQDs) on plasma-treated FeOOH/WO3 photoanodes is artificially imitated to access the band engineering of photoanode design. These multilevel structures offer an effective hole channel that facilitates the extraction of photoexcited holes and direct photovoltaic effect on CQDs, displaying a faradaic efficiency of 88.0% for oxygen generation. In addition, remarkable surface efficiency (83.3%), a substantial decrease in the open-circuit voltage (0.425 V) and interfacial charge transfer resistance (215 Ω) over those of pristine WO3 photoanodes (38.2%, 0.425 V and 2250 Ω) are observed.

Graphical abstract: Co-modification of WO3 nanoplates with β-FeOOH/carbon quantum dots combined with plasma treatment enables high-efficiency photoelectrochemical characteristics

Supplementary files

Article information

Article type
Paper
Submitted
18 Apr 2024
Accepted
19 Jun 2024
First published
26 Jun 2024

J. Mater. Chem. A, 2024,12, 19277-19287

Co-modification of WO3 nanoplates with β-FeOOH/carbon quantum dots combined with plasma treatment enables high-efficiency photoelectrochemical characteristics

J. Lee, Z. Yan, K. Lin, P. Hsiao, P. Liao, Y. Pu and C. Chen, J. Mater. Chem. A, 2024, 12, 19277 DOI: 10.1039/D4TA02663B

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements