Issue 1, 2025

Multilevel azopolymer patterning from digital holographic lithography

Abstract

Azopolymer-based maskless lithography enables direct, all-optical fabrication of complex surface patterns. However, typical surface reliefs are limited to smooth profiles. Here, by investigating the resolution, contrast ratio, and gray-scale nonlinearities of a holo-lithographic setup based on computer-generated holography, we extend this patterning approach to fabricate, for the first time, multilevel reliefs with step-like discontinuities.

Graphical abstract: Multilevel azopolymer patterning from digital holographic lithography

Article information

Article type
Communication
Submitted
15 Oct 2024
Accepted
21 Nov 2024
First published
26 Nov 2024
This article is Open Access
Creative Commons BY-NC license

RSC Appl. Interfaces, 2025,2, 56-60

Multilevel azopolymer patterning from digital holographic lithography

M. Salvatore, F. Reda, F. Borbone and S. L. Oscurato, RSC Appl. Interfaces, 2025, 2, 56 DOI: 10.1039/D4LF00358F

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