Issue 1, 2025

Holey etching strategy of siloxene nanosheets to improve the rate performance of photo-assisted Li–O2 batteries

Abstract

Improving the rate performance is of great significance to achieve high-performance photo-assisted Li–O2 batteries for developing new optimized bifunctional photocatalysts. Herein, a holey etching strategy is developed to prepare porous siloxene nanosheets with a size of 10 nm and few layers (P-siloxene NSs) by a modified Ag+-assisted chemical etching method, and the optimized pore-forming conditions are: Ag+ ion concentration 0.01 mol dm−3, HF concentration 0.565 mol dm−3, and H2O2 concentration 0.327 mol dm−3. By using P-siloxene NSs with a bandgap of 2.77 eV as a novel bifunctional photo-assisted Li–O2 system, the rate performance of the assembled P-siloxene NSs photo-assisted Li–O2 batteries is clearly improved. At a current density of 0.1 mA cm−2, the system shows a low overpotential of 0.35 V, full discharge capacity of 3270 mA h g−1, and 69% round-trip efficiency at 100 cycles. In particular, at a current density of 0.8 mA cm−2, the P-siloxene NSs photo-assisted Li–O2 batteries still give a relatively good charge potential of 3.66 V and a discharge potential of 2.97 V. This work provides a new approach for improving the rate performance of photo-assisted Li–O2 systems and will open up opportunities for the high-efficiency utilization of solar energy in electric systems.

Graphical abstract: Holey etching strategy of siloxene nanosheets to improve the rate performance of photo-assisted Li–O2 batteries

Supplementary files

Article information

Article type
Paper
Submitted
20 Sep 2024
Accepted
09 Nov 2024
First published
22 Nov 2024

Nanoscale, 2025,17, 243-251

Holey etching strategy of siloxene nanosheets to improve the rate performance of photo-assisted Li–O2 batteries

W. Xu, Z. Fu, H. Shi, Q. Li, X. He, J. Sun, R. Jiang, Z. Lei and Z. Liu, Nanoscale, 2025, 17, 243 DOI: 10.1039/D4NR03850A

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements