Issue 11, 2025

Synthesis of novel D–π–A-based photosensitive alkoxyamine: application of two-photon polymerization via nitroxide-mediated photopolymerization

Abstract

We present an efficient method for surface customization using a novel D–π–A-based photosensitive alkoxyamine. The D–π–A-based chromophore group exhibits remarkable efficiency in the homolytic cleavage of the >NO–C bond enabling the production of well-defined structures through two-photon stereolithography (TPS). Furthermore, we show that surface customization can be achieved in a second step, owing to the “living” character originating from the alkoxyamine and via a Nitroxide Mediated PhotoPolymerization (NMP2) process. Additionally, we investigated how TPS-related parameters such as wavelengths and laser power influence the re-polymerization step.

Graphical abstract: Synthesis of novel D–π–A-based photosensitive alkoxyamine: application of two-photon polymerization via nitroxide-mediated photopolymerization

Supplementary files

Article information

Article type
Paper
Submitted
02 Dec 2024
Accepted
29 Jan 2025
First published
05 Feb 2025
This article is Open Access
Creative Commons BY license

Polym. Chem., 2025,16, 1248-1255

Synthesis of novel D–π–A-based photosensitive alkoxyamine: application of two-photon polymerization via nitroxide-mediated photopolymerization

N. H. Nguyen, X. Wu, Y. Guillaneuf, A. Spangenberg, D. Gigmes and J. Clément, Polym. Chem., 2025, 16, 1248 DOI: 10.1039/D4PY01377H

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