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Electrochemical Copper Deposition in Etched Ion Track Membranes

By Schuchert, I U; Molares, M E Toimil; Dobrev, D; Vetter, J; Neumann, R; Martin, M

Publication Date: 2003

Journal: Journal of the Electrochemical Society.

Volume: 150

Issue: 4

Page: C189

ISSN: 0013-4651

Resource: Article

DOI: 10.1149/1.1554722

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