Improved photocatalytic activity and mechanism of Cu2O/N–TiO2 prepared by a two-step method

Zhengwei Luo, Hui Jiang, Dan Li, Longzhi Hu, Wenhua Geng*, Ping Wei and Pingkai Ouyang
College of Biotechnology and Pharmaceutical Engineering, Nanjing Tech University, Puzhu South Road 30#, Nanjing, 211816, P. R. China. E-mail: gengwenhua@njtech.edu.cn; Fax: +86-25-58139382; Tel: +86-25-58139382

Received 26th December 2013 , Accepted 1st April 2014

First published on 4th April 2014


Abstract

Cu2O/N–TiO2 was achieved through a two-step route by deposition of CuO on Degussa P25 TiO2 using a wet impregnation method and then treatment with N2/Ar plasma. The morphology, composition, and structure of the prepared catalysts were characterized using X-ray diffraction (XRD), transmission electron microscopy (TEM), X-ray photoelectron spectroscopy (XPS), and electron paramagnetic resonance (EPR). XRD spectra indicated that neither the low-content copper oxides nor the plasma treatment changed the crystalline phase of TiO2. XPS results indicated the transformation of Cu species from CuO to Cu2O and the doping of N after plasma treatment. EPR spectra confirmed the formation of Ti3+ that was also induced by plasma treatment. TEM analysis revealed that the well crystallized Cu2O nanoparticles, existed with sizes of ∼3 nm, dispersed uniformly on the surface of TiO2. As for the optical absorption curves obtained by UV-vis absorption spectroscopy, an extended absorption edge of Cu2O/N–TiO2 was confirmed compared with that of TiO2 and CuO/TiO2. In addition, the photodegradation efficiency of methyl orange (MO) solutions over Cu2O/N–TiO2 were markedly enhanced under both the visible and full-spectrum light irradiation in comparison with TiO2 and CuO/TiO2. The mechanism of photocatalytic reaction over Cu2O/N–TiO2 corresponding to UV and visible light irradiation was discussed.


1. Introduction

Titanium dioxide has been extensively studied and used in a vast variety of applications ascribed to the exceptional physical and chemical properties in photocatalysis,1,2 however, its photocatalytic efficiency is restricted by the large band gap (3.2 eV for anatase) and the rapid recombination rate of photogenerated charge carriers. Generally, TiO2 can only be excited by UV light under 387 nm that just accounts for 3–5% of solar spectrum, of which less than 10% of the energy can be utilized due to the high recombination rate.3,4

So far, numerous modification methods have been developed to enhance the photocatalytic activity of TiO2 by shifting the optical response to the visible light region and decrease the electron–hole recombination rate, such as non-mental doping,5,6 transition metal loading,7 self-modification,8 and so on. Among these methods, nitrogen doping is regarded as one of the most effective approaches to extend the absorption edge from the UV to the visible light region owing to the induced N 2p state,4,9–11 but the interband states always cause the decrease of oxidation/reduction potential of photogenerated charge carries. Cu2O is one of the p-type direct band gap semiconductors with a narrow band gap of ∼2 eV, Cu2O nanoparticle-loaded TiO2 was proved to be an efficient photocatalytic material by effective separation of charge carriers and reducing of the recombination rate of electron–hole pairs in nano–nano heterostructure, and the absorption of Cu2O to visible light greatly extends the absorption range of Cu2O/TiO2 heterostructure.12–17

Recently, there has been growing interests about the multiple modification methods, such as the codoping of TiO2 with N and Cu. Morikawa et al. prepared Cu loaded TiO2−xNx using a wet impregnation method and revealed that the photocatalytic activity of metal oxide loaded TiO2−xNx was twice than that of TiO2−xNx.18 Co-modifications of TiO2 with Cu and N were also achieved by other methods, such as using N2 gas plasma in the presence of Cu foil19 or coprecipitation.20 It is worth noting that plasma treatment was taken as an effective way to induce surface modification. All the modified photocatalysts resulted in photocatalytic activity enhancement and absorption edge expansion, but the mechanism of the superior performance was rarely explored, especially the relationship among the dopants and the effect of each other.21

In this paper, Cu2O/N–TiO2 was prepared through a two-step route by deposition of CuO nanoparticles using a wet impregnation method and then treatment with N2/Ar dielectric barrier discharge (DBD) plasma. The morphology, structure, and composition of the photocatalysts were systematically characterized by X-ray diffraction (XRD), UV-vis absorption spectroscopy, transmission electron microscopy (TEM), X-ray photoelectron spectroscopy (XPS), and electron paramagnetic resonance (EPR). And the photocatalytic activity was evaluated by monitoring the photodecoloration of methyl orange (MO) solution under irradiation of 300 W xenon light with 400 nm cut-off or not. The mechanisms of the charge carrier redistribution and photocatalytic activity enhancement under irradiation of light in different wavelength were also proposed.

2. Experimental

2.1 Preparation of Cu2O/N–TiO2 samples

CuO nanoparticles (Cu[thin space (1/6-em)]:[thin space (1/6-em)]Ti = 0–5 at%) were deposited on Degussa P25 TiO2 using a minor modified simple impregnation method described by Liu et al.22 Briefly, 1 g of TiO2 was dispersed in 100 mL of 0.25 M NaOH aqueous solution, and then a certain volume of 0.05 M Cu(NO3)2·3H2O solution was added dropwise under vigorous stirring. After further stirring for 6 h, the precipitates were filtrated and washed with deionized water until pH to 7, then dried at 80 °C for 12 h and subsequently calcined at 400 °C for 2 h in air. The final powders were in blue to black with the increasing Cu[thin space (1/6-em)]:[thin space (1/6-em)]Ti ratios. At last, the resultant CuO/TiO2 was then treated with N2/Ar plasma in a DBD plasma reactor.

The experimental set-up arrangement for the plasma treatment is presented in Fig. 1. Molybdenum wire was served as the outer electrode and winded around a 60 mm outer diameter corundum tube compactly, and a stainless steel rod (40 mm in diameter) was settled in the center of the corundum tube and acted as the inner electrode, which was connected to the high voltage. The discharge gap between the corundum tube and inner electrode was 7 mm, where a quartz boat with the samples was placed. During the experiments, a high-voltage pulse power supply was used to generate dielectric barrier discharge plasma between the steel electrode and the outer electrode that attached to the ground.


image file: c3ra47973k-f1.tif
Fig. 1 Sketch of the experimental set-up arrangement for the plasma treatment.

N2 (99.999%) and Ar (99.999%) were introduced into the reactor, the pressure and flow rates of N2 and Ar were controlled with the mass flow controllers. The experiments were carried out with the changes in the power delivered to the plasma, plasma treatment time, reaction pressure, and gas composition.

2.2 Structural characterization

XRD analysis was carried out to verify the crystal structures of the photocatalysts in a diffractometer (Rigaku, Smartlab3) with Cu Kα radiation (λ = 1.5418 Å) at 40 kV and 30 mA. The patterns were recorded in a range from 20° to 80° (2θ) with a step size of 0.02° s−1.

UV-vis absorption spectra was collected over the wavelength range 300–800 nm on a PerkinElmer Lambda 950 scanning spectrophotometer fitted with a 150 mm integrating sphere attachment. Polytetrafluoroethene was used as the reference.

The lattice structure was visualized by TEM using a JEOL JEM 2010F electron microscope instrument, equipped with a field emission gun (FEG) electron source using an acceleration voltage of 200 kV.

XPS analysis was performed on a PHI 5000 VersaProbe system to measure the surface properties of the photocatalysts. The general C 1s, O 1s, N 1s, Ti 2p, and Cu 2p core level spectrum scan was performed. All binding energies were referenced to the C 1s peak of the adventitious carbon on the surface at 284.6 eV.

EPR spectra were recorded at 77 K on an EMX 10/12 spectrometer working in the X-band with 10 mg of the sample introduced into an EPR quartz probe cell.

2.3 Photocatalytic evaluation

The photocatalytic activity of each photocatalyst was evaluated by monitoring the decomposition of MO in a self-assembled apparatus. Before irradiation, an adsorption–desorption equilibrium was attained by stirring using a magnetic stirrer for 30 minutes.

A solution of 100 mL of MO (10 mg L−1) and 0.10 g of catalyst were placed into a water-cooled jacket beaker, which was open to air. The sample was illuminated using a xenon light source of 300 W (CEL-HXF 300) at a distance of 5 cm from the reactor, and the photocatalytic reactions were carried out at neutral pH conditions. For visible-light irradiation, UV-cut filter of 400 nm was used to eliminate UV light irradiation. The temperature of the suspension was kept at about 20 °C by an external cooling jacket with recycled water. The suspension was irradiated for different time intervals (20 or 120 minutes for full-spectrum and visible light, respectively), and a 5 mL aliquot was sampled and filtrated through a 0.45 μm syringe filter to remove the photocatalyst particles, then the dye photodegradation was monitored by measuring the absorbance of MO concentration before (C0) and after (C) irradiation using a UV-vis spectrometer (Spectrumlab 752s) at 464 nm, and the decomposition efficiency (%) was used to represent the photocatalytic activity.

3. Results and discussion

3.1 Characterization of TiO2, CuO/TiO2, and Cu2O/N–TiO2

XRD patterns of TiO2, CuO/TiO2, and Cu2O/N–TiO2 are shown in Fig. 2. The P25 TiO2 powder is composed of about 20% rutile and 80% anatase, and when P25 was deposited with Cu nanoparticles, the changes on peak position or intensity were rarely observed on the X-ray powder patterns of titania polymorphs. For all the photocatalysts, no significant characteristic diffraction peaks responding to Cu or CuxO were detected even when the Cu[thin space (1/6-em)]:[thin space (1/6-em)]Ti ratio was increased up to 5%, it perhaps attributed to the extremely small clusters and/or the lower copper content in these samples,23,24 which could be confirmed by TEM. Furthermore, the N2/Ar plasma treatment also didn't change XRD patterns, which means it has no effect on the crystal structure of TiO2.
image file: c3ra47973k-f2.tif
Fig. 2 XRD patterns of TiO2, CuO/TiO2, and Cu2O/N–TiO2 samples.

Fig. 3 shows a comparison of the UV-vis absorption spectra of the photocatalysts. According to these spectra, the loaded copper and plasma treatment didn't induce the change of band gap, and the absorption at the wavelength shorter than 400 nm was attributed to the intrinsic band gap absorption of TiO2.12 Meanwhile, it's obviously that the light absorption by CuO/TiO2 and plasma-treated Cu2O/N–TiO2 was strongly affected compared with the spectra of TiO2.


image file: c3ra47973k-f3.tif
Fig. 3 Optical absorption curves of TiO2, CuO/TiO2, and plasma treated Cu2O/N–TiO2.

For CuO/TiO2, a great increase in the absorption at wavelength longer than 400 nm was observed. Since CuO is a semiconductor with a narrow band gap, it can be excited by visible light and obtain absorption at 400–600 nm centered at 500 nm.25 While the increase of the absorption can also be observed in the 700–800 nm wavelength region because of d–d transition of Cu2+ ions. This kind of absorption was considered to have no contribution to the increase of photogenerated carries but just extend their lifetime.18 Electrons transfer from the valence band (VB) of TiO2 to the metal ions attached to the surface of TiO2, which is known as interfacial charge transfer (IFCT), may also result in absorption around 450 nm.26

Moreover, a red shift of absorption edges is referring to the sample after plasma treatment. It has been reported that oxygen vacancies (Ov) could be generated on TiO2 during N2 plasma process and produced TiO2−xNx.27–30 The plasma treatment leads to the configuration of Ov and N 2p state located at ∼1.18 and ∼2.48 eV below the conduction band (CB),31–33 which also causes visible light absorption.

TEM images are shown in Fig. 4. The HR-TEM images show the clear lattice fringes of TiO2 nanoparticles and confirm the crystallinity of the TiO2, but Cu2O rarely exists in 1% Cu2O/N–TiO2 due to the low content (Fig. 4b), which is consistent with the former research.22 In Fig. 4c and d, the nanoparticles, in the size of ∼3 nm, are well dispersed on the surface of TiO2 in 5% Cu2O/N–TiO2. Since the charge transfer rate across the interface of Cu2O and TiO2 relies on the size of Cu2O particles, the diffusion of charge carries across the interface can be more favorable in this work.24,34,35 As shown in Fig. 4c and d, the fringes with a distance of 0.208 nm match well with {111} planes of cubic Cu2O.36 A lattice fringe of 0.240 nm is assigned to {001} plane of rutile TiO2.


image file: c3ra47973k-f4.tif
Fig. 4 TEM images of (a) TiO2, (b) 1% Cu2O/N–TiO2, (c and d) 5% Cu2O/N–TiO2.

The XPS analysis was carried out to determine the surface composition of samples and to identify the valence state of various species. As illustrated in Fig. 5a, before the plasma treatment, the Cu 2p spectra of CuO/TiO2 samples reveal two peaks (Cu 2p3/2 at 933.1 eV, and Cu 2p1/2 at 952.9 eV), but the satellite peak (at ∼942.2 eV), which can be characterized as Cu2+,22 is not obvious due to fact that the concentration of Cu is low (1% in this research) in comparison with other researches.23 Interestingly, the peak related to the Cu2+ state shifts to lower binding energy compared with usual 933.2–934.6 eV,37 because highly dispersed or calcined Cu2+ species have a lower binding energy than bulk Cu2+ in CuO.38,39 While after plasma treatment, the binding energy of Cu 2p3/2 shifted to a low binding energy of 931.7 eV, suggesting that Cu, Cu2O or Cu hydroxides are present on the catalyst surface. The Cu2+ was reduced to Cu+ by high energetic electrons and active species during plasma treatment.19 Combined with previous TEM images, it's believed that the Cu species incorporated on the surface of TiO2 mainly exist as Cu2O.23


image file: c3ra47973k-f5.tif
Fig. 5 XPS spectra of (a) Cu 2p, (b) N 1s, (c) Ti 2p, and (d) O 1s before and after treatment, respectively.

N 1s spectrum of plasma-treated sample was shown in Fig. 5b, and the peaks at 399.4 and 396.3 eV were found. Many researchers thought the N 1s peaks around 399–400 eV were corresponding to chemisorbed γ-N2 molecules incorporated into TiO2 lattice, while other researchers assigned the peaks in the range of 399–400 to the presence of NO and/or interstitial nitrogen species40 for the reason that molecular N2 is impossible to be chemisorbed on metal oxides at room temperature. N 1s peak around 396 eV has been assigned to β-N atoms in Ti–N bonds and shows the substitution of O by N in the TiO2 lattice, which is responsible for the visible light absorption.4,41

As shown in Fig. 5c, the peaks of Ti 2p1/2 and Ti 2p3/2 for the undoped TiO2 sample were observed at 465.0 and 459.5 eV, respectively, which indicated that the Ti of TiO2 is in the form of Ti4+ ions. When N2/Ar plasma was applied to change CuO/TiO2 into Cu2O/N–TiO2, the peaks of Ti 2p1/2 and Ti 2p3/2 were shifted to 464.0 eV and 458.5 eV, respectively. This clearly showed a decrease in the binding energy of Ti 2p, which indicated that nitrogen was successfully incorporated into the TiO2 lattice.20,42 Ti3+ may be formed due to the chemical modification induced by the sputtering of plasma.43 Fig. 5d presents the O 1s spectra for the samples. Peaks of the O 1s region for the TiO2 sample were observed at 528.1 and 529.2 eV. The peak at 528.1 eV could be attributed to the oxygen in the TiO2 lattice, while the signal at 529.2 eV could be ascribed to the metal oxide and metal–OH. The peaks of the O 1s region moved to significantly lower binding-energy levels for the N-doped TiO2 sample, indicating the incorporation of nitrogen into the TiO2.20

Furthermore, EPR spectra (Fig. 6) of photocatalysts recorded at 77 K was obtained to identify the presence of Ti3+ before and after plasma treatment. It was reported that paramagnetic Ti3+ has a g-value of 1.94–1.99.30,44 The unmodified TiO2 and plasma-treated TiO2 all reveal the signal of Ti3+. The signal of pristine P25 at g = 1.975 indicates the existence of intrinsic defect, and the stronger EPR signal of plasma-treated P25 attributed to the plasma treatment. Meanwhile, the surface Ti3+ defect sites would adsorb and react with oxygen molecules to form O and O2− species, which have signals around g = 2.00.45 But they may overlap with the broad Ti3+ signal and thus be invisible in our spectrum.46


image file: c3ra47973k-f6.tif
Fig. 6 EPR spectra of the samples before and after plasma treatment recorded at 77 K.

3.2 Photocatalytic activity for the photodegradation of MO

To evaluate and compare the photocatalytic activity of TiO2, CuO/TiO2, and Cu2O/N–TiO2, the degradation of MO under visible light irradiation for 120 min and full-spectrum light irradiation for 20 min was monitored, and the values obtained by the repetition (three times) are shown in Fig. 7(a). From the figure, the photodecoloration efficiency of MO follows the trend of Cu2O/N–TiO2 > CuO/TiO2 > TiO2, which revealed the promotion effects of Cu species and plasma treatment no matter under visible or solar irradiation.47 Photocatalytic activity of CuO/TiO2 and Cu2O/N–TiO2 nanoparticles was considerably increased with respect to that of pure TiO2. The repeated experiments for the photodegradation of MO were performed by Cu2O/N–TiO2 to investigate the photochemical stability of the catalyst, and the results are shown in Fig. 7(b). The photocatalytic activity of reused Cu2O/N–TiO2 was slightly decreased even after being repeatedly used for 5 cycles, which may due to the aggregation of photocatalyst during separation and dry process, and the photochemical stability of the Cu2O/N–TiO2 under the irradiation of both the full-spectrum light and the visible light was considerable in general. According to Dong et al., metal ions deposited on the surface of N doped TiO2 could improve the stability of the doping nitrogen, thus enhancing the photochemical stability of as-prepared photocatalyst.48
image file: c3ra47973k-f7.tif
Fig. 7 (a) Degradation of MO under visible light irradiation for 120 min (blue) and full-spectrum light irradiation for 20 min (red) by TiO2, CuO/TiO2, and Cu2O/N–TiO2 (three repetition experiments), respectively. (b) Photochemical experiments of Cu2O/N–TiO2 under visible light irradiation (blue) and full-spectrum light irradiation (red) after being repeatedly used for 5 cycles.

For CuO/TiO2, the photoactivity was augmented gradually with the increase of Cu[thin space (1/6-em)]:[thin space (1/6-em)]TiO2 ratio (Fig. 8). However, it was decreased with the further increase of copper above 1.0%, so we choose the Cu/TiO2 in the ratio of 1% for the subsequent plasma treatment. This may be due to the fact that the excess copper species on TiO2 surface act as charge recombination center, which is detrimental to the photocatalytic activity of the catalyst.49 It's also possible that the CuO and Cu2O particles loaded onto the TiO2 photocatalyst absorb the light, resulting in a decrease of light reaching to the catalyst.18 Additionally, the densely covered nanoparticles reduce the opportunity of interaction between catalysts and substances.


image file: c3ra47973k-f8.tif
Fig. 8 Degradation of MO under visible light irradiation for 120 min (black) and full-spectrum light irradiation for 20 min (red) by CuO/TiO2 in varies Cu/TiO2 ratio (three repetition experiments), respectively.

Meanwhile, it seems that plasma treatment is an effective way to induce the promotion of photodegradation efficiency. The power delivered to the plasma, treatment time, reaction pressure, and gas composition all have effects on the treated samples.42,50,51 In this study, the Cu2O/N–TiO2 was obtained under the optimal plasma conditions of N2[thin space (1/6-em)]:[thin space (1/6-em)]Ar = 4[thin space (1/6-em)]:[thin space (1/6-em)]1, 20 min of time, and current at 1.5 A (380 volts). Long-time plasma treatment would lead to the formation of excess Ov, which acts as recombination site for electrons and holes and leads to poor performance.52 The concentration of N species and ratio of β-N to γ-N are deeply affected by the gas composition, and the low proportion of N2 will lead to the decrease of doped N species. Additionally, different N precursors form different groups in TiO2, which may have diametrically opposite effects on catalytic activity.42 The power delivered to the plasma treatment is also a controllable element for the character of catalyst.19

3.3 Mechanism of photocatalytic reaction over Cu2O/N–TiO2

Both the absorption edge and photocatalytic activity are improved by Cu oxides deposition and band structure modification. Cu2O is a relatively narrow band gap p-type semiconductor, in which both the conduction and the valence bands lie above those of TiO2. Generally, it's known that the combination of Cu2O and TiO2 forms type-II heterojunction, in which electrons transfer from Cu2O to TiO2, whereas holes transfer in the opposite direction to achieve e–h separation.17,43,53 According to the band structure, when the photocatalytic test is carried out under visible light that only Cu2O can be excited due to its narrow band gap, electrons can be excited in p-type Cu2O and move to TiO2. Caused by the charge flow, the efficiency of the visible light utilization can be significantly improved, leading to a higher photocatalytic activity. Moreover, the photoabsorption of Cu2O-loaded TiO2 extends into the visible light region.

Besides, it's believed that the induced N exists as N 2p localized states shallow above the VB of TiO2 other than mixed with O 2p,9–11 which composes the VB. The N 2p intraband was thought to be the origin of visible light response, and photoexcitation of N 2p to Ti 3d (Ti 3d ← N 2p transition) provides visible light-induced photocatalysis over N–TiO2.21

Apart from the substitutional N in the lattice, other defects also play a vital role in visible light response, such as interstitial N and Ov. For example, the grafted Cu species promote the formation of one-electron defect sites (Ov).54 Especially, Ti3+ species were inevitably induced by collision between active species and the surface of catalyst during the plasma treatment.28,30,55,56 The Ti3+ would be formed as isolated states in the forbidden gap. This isolated band has various electric levels from 0.3 and 0.8 eV below the CB minimum. The formed Ti3+ states in its forbidden gap would cause visible light absorption, although this kind of effect was negligible.32,57 The active species generated during the plasma treatment could partially reduce TiO2 and induce a shift of the absorption edge. Our results are in agreement with previous studies that Ar, H2, and N2 plasma were used.28,29,47,55,58 Meanwhile, the Ti3+ species on the TiO2 support may also induce efficient catalytic activity by a strong electron interaction between Cu2+ in highly dispersed CuO and Ti3+ on rutile TiO2 (Cu2+ + Ti3+ → Cu+ + Ti4+), which leads to the high activity of the catalysts.39

Combined with the previous reports, we postulated that there exist two specific mechanisms with regard to photogenerated charge carrier transferring in conjunction with visible and UV light irradiation, respectively.

On the one hand, when irradiated by UV light that can activate TiO2 even N 2p state, the photoexcited electrons are activated from VB to the CB of N–TiO2, then transfer to the loaded Cu species, which inhibits the recombination of electrons and holes, and leads to the promotion of catalytic efficiency (Fig. 9A).21,59 At the same time, Cu2O can be excited due to the narrower band gap compared with TiO2. The generated electrons transfer to CB and are ready to react with absorbents.


image file: c3ra47973k-f9.tif
Fig. 9 The schematic diagram of the mechanism for charge carrier redistribution in Cu2O/N–TiO2 irradiated by (A) full-spectrum light and (B) visible light.

On the other hand, when the energy of photons is not strong enough to stimulate electrons in VB of TiO2 (Fig. 9B), the excited electrons from N 2p states will be trapped by deep defect levels and can't transfer to Cu species unless extra energy was applied.21 But the electrons stimulated from Cu2O can migrate to CB of TiO2 because of the disequilibrium between TiO2 and Cu2O.59 Meanwhile, the IFCT mechanism may be also suitable for the Cu2O/N–TiO2 system. The interband structure of Cu2O/N–TiO2 is more favorable to induce IFCT than CuO/TiO2.26,60,61 Just like Cu/WO3, the electrons generated by interband excitation after visible light irradiation can also transfer to Cu species through IFCT.26 Then the electrons and holes react with substances on the interface, respectively. Irie et al.26,60 proposed that the visible light sensitivity was caused by the photo-induced IFCT from the VB of oxides to Cu ions, and the reduced Cu species act as a multi-electron oxygen reduction catalyst. Visible light can be absorbed by the IFCT between the VB of TiO2 and surface-modified Cu ions. In addition, the strong oxidation power of holes produced in the VB of TiO2 is utilized. This speculation was experimentally confirmed using electron spin resonance and chemiluminescence.61,62

Overall, the generated holes and electrons react with water and oxygen, respectively, to form O-centered radical intermediates such as ˙OH, ˙OOH, and ROO˙.63 The intermediate active species will react with substances that absorbed on the surface of catalyst.

There are other opinions think that the Cu species enhanced photocatalytic activity under visible light by a strong interaction with intermediates. For example, Li et al.64 attributed the photocatalytic improvements to the surface/interfacial Cu2+ sites in the 0.1% CuO/TiO2 nanocomposite that function as unique adsorption sites for reactant molecules and facilitate the subsequent photocatalytic degradation. But the information of active intermediates has not been obtained yet.

Though the effect of N2/Ar plasma treatment on Cu2O can't be characterized in our study, it should still be taken into consideration. The N doping of Cu2O would lead to the optical band gap widening and shift of VB and CB. The interband would be formed also, resulting in enhancement of absorption ability for solar light.65,66

4. Conclusion

Cu2O/N–TiO2 was achieved by loading with optimal content of CuO on TiO2 and followed by N2/Ar plasma treatment, and efficient photocatalytic ability for MO degradation under both visible and full-spectrum light irradiation was obtained. After Cu deposition and plasma treatment, the band gap of TiO2 is still preserved. The highly dispersed Cu species transfer to well-crystal Cu2O after N2/Ar plasma treatment. Meanwhile, substitutional N and other defects (like Ov and interstitial N) are induced at the same time. Due to the formation of p–n heterojunction and intraband deep localized states, the trapping of electrons and the charge carrier lifetime enhancement of Cu2O/N–TiO2 are more effective than that of TiO2 and CuO/TiO2.

We speculated the mechanism for enhancement of the photocatalytic activity irradiated by light at different wavelength. Mechanisms for enhancement of the photocatalytic activity differ depending on the excitation wavelength. When irradiated by full-spectrum light that can activate electrons on VB of TiO2, the generated charge carriers transfer to the loaded Cu species and lead to the decrease of recombination of electron and hole, which would enhance the photocatalytic activity. While irradiated by visible light that can only stimulate the electrons on VB of Cu2O and interband states of N–TiO2, the charge carriers can be separated well via the migration from Cu2O to TiO2.

Acknowledgements

The authors acknowledge the project supported by the Natural Science Foundation of Jiangsu province, China (no. BK2011808) and the Natural Science Foundation of the Jiangsu Higher Education Institutions of China (no. 10KJB61005).

References

  1. X. Chen and S. S. Mao, Chem. Rev., 2007, 107, 2891–2959 CrossRef CAS PubMed.
  2. M. Pelaez, N. T. Nolan, S. C. Pillai, M. K. Seery, P. Falaras, A. G. Kontos, P. S. M. Dunlop, J. W. J. Hamilton, J. A. Byrne, K. O'Shea, M. H. Entezari and D. D. Dionysiou, Appl. Catal., B, 2012, 125, 331–349 CrossRef CAS PubMed.
  3. Z. Zou, J. Ye, K. Sayama and H. Arakawa, Nature, 2001, 414, 625–627 CrossRef CAS PubMed.
  4. R. Asahi, T. Morikawa, T. Ohwaki, K. Aoki and Y. Taga, Science, 2001, 293, 269–271 CrossRef CAS PubMed.
  5. L. G. Devi and R. Kavitha, Appl. Catal., B, 2013, 140–141, 559–587 CrossRef CAS PubMed.
  6. X. Zong, G. Lu and L. Wang, Nonmetal Doping in TiO2 Toward Visible-Light-Induced Photocatalysis, Springer, Berlin Heidelberg, 2013, pp. 1–27 Search PubMed.
  7. G. S. Pozan, M. Isleyen and S. Gokcen, Appl. Catal., B, 2013, 140–141, 537–545 CrossRef CAS PubMed.
  8. J. Su, X. Zou and J. Chen, RSC Adv., 2014, 4, 13979–13988 RSC.
  9. C. Di Valentin, G. Pacchioni, A. Selloni, S. Livraghi and E. Giamello, J. Phys. Chem. B, 2005, 109, 11414–11419 CrossRef CAS PubMed.
  10. R. Nakamura, T. Tanaka and Y. Nakato, J. Phys. Chem. B, 2004, 108, 10617–10620 CrossRef CAS.
  11. H. Irie, Y. Watanabe and K. Hashimoto, J. Phys. Chem. B, 2003, 107, 5483–5486 CrossRef CAS.
  12. W. J. Foo, C. Zhang and G. W. Ho, Nanoscale, 2013, 5, 759–764 RSC.
  13. H. Liu, J. Yang, Y. Zhang, S. Chen, A. Walsh, H. Xiang, X. Gong and S. Wei, Phys. Chem. Chem. Phys., 2013, 15, 1778–1781 RSC.
  14. K. Lalitha, G. Sadanandam, V. D. Kumari, M. Subrahmanyam, B. Sreedhar and N. Y. Hebalkar, J. Phys. Chem. C, 2010, 114, 22181–22189 CAS.
  15. L. Yang, S. Luo, Y. Li, Y. Xiao, Q. Kang and Q. Cai, Environ. Sci. Technol., 2010, 44, 7641–7646 CrossRef CAS PubMed.
  16. Y. Wu, G. Lu and S. Li, Catal. Lett., 2009, 133, 97–105 CrossRef CAS.
  17. Y. Hou, X. Li, X. Zou, X. Quan and G. Chen, Environ. Sci. Technol., 2008, 43, 858–863 CrossRef.
  18. T. Morikawa, Y. Irokawa and T. Ohwaki, Appl. Catal., A, 2006, 314, 123–127 CrossRef CAS PubMed.
  19. R. Trejo-Tzab, J. J. Alvarado-Gil, P. Quintana and P. Bartolo-Pérez, Catal. Today, 2012, 193, 179–185 CrossRef CAS PubMed.
  20. C. Kim, J. Shin, Y. Cho, H. Jang, H. Byun and T. Kim, Appl. Catal., A, 2013, 455, 211–218 CrossRef CAS PubMed.
  21. K. Yamanaka, T. Ohwaki and T. Morikawa, J. Phys. Chem. C, 2013, 117, 16448–16456 CAS.
  22. L. Liu, F. Gao, H. Zhao and Y. Li, Appl. Catal., B, 2013, 134–135, 349–358 CrossRef CAS PubMed.
  23. I. Tseng, W. Chang and J. C. S. Wu, Appl. Catal., B, 2002, 37, 37–48 CrossRef CAS.
  24. L. Liu, X. Gu, C. Sun, H. Li, Y. Deng, F. Gao and L. Dong, Nanoscale, 2012, 4, 6351–6359 RSC.
  25. Y. Qu, X. Li, G. Chen, H. Zhang and Y. Chen, Mater. Lett., 2008, 62, 886–888 CrossRef CAS PubMed.
  26. H. Irie, S. Miura, K. Kamiya and K. Hashimoto, Chem. Phys. Lett., 2008, 457, 202–205 CrossRef CAS PubMed.
  27. T. Ihara, M. Miyoshi, Y. Iriyama, O. Matsumoto and S. Sugihara, Appl. Catal., B, 2003, 42, 403–409 CrossRef CAS.
  28. C. Huang, L. Chen, K. Cheng and G. Pan, J. Mol. Catal. A: Chem., 2007, 261, 218–224 CrossRef CAS PubMed.
  29. Y. K. Chae, S. Mori and M. Suzuki, Thin Solid Films, 2009, 517, 4260–4263 CrossRef CAS PubMed.
  30. I. Nakamura, N. Negishi, S. Kutsuna, T. Ihara, S. Sugihara and K. Takeuchi, J. Mol. Catal. A: Chem., 2000, 161, 205–212 CrossRef CAS.
  31. Y. Nakano, T. Morikawa, T. Ohwaki and Y. Taga, Appl. Phys. Lett., 2005, 86, 132104 CrossRef PubMed.
  32. Z. Lin, A. Orlov, R. M. Lambert and M. C. Payne, J. Phys. Chem. B, 2005, 109, 20948–20952 CrossRef CAS PubMed.
  33. S. Livraghi, M. C. Paganini, E. Giamello, A. Selloni, C. Di Valentin and G. Pacchioni, J. Am. Chem. Soc., 2006, 128, 15666–15671 CrossRef CAS PubMed.
  34. W. A. Tisdale, K. J. Williams, B. A. Timp, D. J. Norris, E. S. Aydil and X. Y. Zhu, Science, 2010, 328, 1543–1547 CrossRef CAS PubMed.
  35. P. V. Kamat, J. Phys. Chem. Lett., 2012, 3, 663–672 CrossRef CAS.
  36. J. Xing, Z. P. Chen, F. Y. Xiao, X. Y. Ma, C. Z. Wen, Z. Li and H. G. Yang, Chem.–Asian J., 2013, 8, 1265–1270 CrossRef CAS PubMed.
  37. Z. Zheng, B. Huang, Z. Wang, M. Guo, X. Qin, X. Zhang, P. Wang and Y. Dai, J. Phys. Chem. C, 2009, 113, 14448–14453 CAS.
  38. M. Y. Kang, H. J. Yun, S. Yu, W. Kim, N. D. Kim and J. Yi, J. Mol. Catal. A: Chem., 2013, 368–369, 72–77 CrossRef CAS PubMed.
  39. C. S. Chen, T. C. Chen, C. C. Chen, Y. T. Lai, J. H. You, T. M. Chou, C. H. Chen and J. Lee, Langmuir, 2012, 28, 9996–10006 CrossRef CAS PubMed.
  40. B. Viswanathan and K. R. Krishanmurthy, Int. J. Photoenergy, 2012, 2012, 269654 CrossRef PubMed.
  41. H. Irie, Y. Watanabe and K. Hashimoto, J. Phys. Chem. B, 2003, 107, 5483–5486 CrossRef CAS.
  42. C. Chen, H. Bai and C. Chang, J. Phys. Chem. C, 2007, 111, 15228–15235 CAS.
  43. A. Paracchino, V. Laporte, K. Sivula, M. Grätzel and E. Thimsen, Nat. Mater., 2011, 10, 456–461 CrossRef CAS PubMed.
  44. J. C. Conesa and J. Soria, J. Phys. Chem., 1982, 86, 1392–1395 CrossRef CAS.
  45. J. Strunk, W. C. Vining and A. T. Bell, J. Phys. Chem. C, 2010, 114, 16937–16945 CAS.
  46. B. Pattier, M. Henderson, A. Pöppl, A. Kassiba and A. Gibaud, J. Phys. Chem. B, 2010, 114, 4424–4431 CrossRef CAS PubMed.
  47. I. Nakamura, N. Negishi, S. Kutsuna, T. Ihara, S. Sugihara and K. Takeuchi, J. Mol. Catal. A: Chem., 2000, 161, 205–212 CrossRef CAS.
  48. F. Dong, H. Wang, Z. Wu and J. Qiu, J. Colloid Interface Sci., 2010, 343, 200–208 CrossRef CAS PubMed.
  49. N. R. Khalid, E. Ahmed, Z. Hong, M. Ahmad, Y. Zhang and S. Khalid, Ceram. Int., 2013, 39, 7107–7113 CrossRef CAS PubMed.
  50. D. J. V. Pulsipher, I. T. Martin and E. R. Fisher, ACS Appl. Mater. Interfaces, 2010, 2, 1743–1753 CAS.
  51. S. Dahle, R. Gustus, W. Viöl and W. Maus-Friedrichs, Plasma Chem. Plasma Process., 2012, 32, 1109–1125 CrossRef CAS PubMed.
  52. K. Prabakar, T. Takahashi, T. Nezuka, K. Takahashi, T. Nakashima, Y. Kubota and A. Fujishima, J. Vac. Sci. Technol., A, 2007, 25, 1188–1192 CAS.
  53. J. Zhang, H. Zhu, S. Zheng, F. Pan and T. Wang, ACS Appl. Mater. Interfaces, 2009, 1, 2111–2114 CAS.
  54. S. Carrettin, Y. Hao, V. Aguilar-Guerrero, B. C. Gates, S. Trasobares, J. J. Calvino and A. Corma, Chem.–Eur. J., 2007, 13, 7771–7779 CrossRef CAS PubMed.
  55. H. Abe, T. Kimitani and M. Naito, J. Photochem. Photobiol., A, 2006, 183, 171–175 CrossRef CAS PubMed.
  56. K. B. Jaimy, V. P. Safeena, S. Ghosh, N. Y. Hebalkar and K. G. K. Warrier, Dalton Trans., 2012, 41, 4824–4832 RSC.
  57. M. Liu, X. Qiu, M. Miyauchi and K. Hashimoto, Chem. Mater., 2011, 23, 5282–5286 CrossRef CAS.
  58. X. Chen, L. Liu, P. Y. Yu and S. S. Mao, Science, 2011, 331, 746–750 CrossRef CAS PubMed.
  59. G. Barolo, S. Livraghi, M. Chiesa, M. C. Paganini and E. Giamello, J. Phys. Chem. C, 2012, 116, 20887–20894 CAS.
  60. H. Irie, K. Kamiya, T. Shibanuma, S. Miura, D. A. Tryk, T. Yokoyama and K. Hashimoto, J. Phys. Chem. C, 2009, 113, 10761–10766 CAS.
  61. Y. Nosaka, S. Takahashi, H. Sakamoto and A. Y. Nosaka, J. Phys. Chem. C, 2011, 115, 21283–21290 CAS.
  62. M. Miyauchi, Z. Liu, Z. Zhao, S. Anandan and H. Tokudome, Langmuir, 2009, 26, 796–801 CrossRef PubMed.
  63. R. Doong, S. Chang and C. Tsai, Appl. Catal., B, 2013, 129, 48–55 CrossRef CAS PubMed.
  64. G. Li, N. M. Dimitrijevic, L. Chen, T. Rajh and K. A. Gray, J. Phys. Chem. C, 2008, 112, 19040–19044 CAS.
  65. Y. Nakano, S. Saeki and T. Morikawa, Appl. Phys. Lett., 2009, 94, 22111 CrossRef PubMed.
  66. Z. Zhao, X. He, J. Yi, C. Ma, Y. Cao and J. Qiu, RSC Adv., 2013, 3, 84–90 RSC.

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