Hui-Wang Cui*a,
Jin-Ting Jiua,
Shijo Nagaoa,
Tohru Sugaharaa,
Katsuaki Suganumaa,
Hiroshi Uchidab and
Kurt A. Schroderc
aInstitute of Scientific and Industrial Research, Osaka University, Mihogaoka 8-1, Ibaraki, Osaka 567, Japan. E-mail: cuihuiwang@eco.sanken.osaka-u.ac.jp; cuihuiwang@hotmail.com
bInstitute for Polymers and Chemicals Business Development Center, Showa Denko K. K., 5-1 Yawata Kaigan Dori, Ichihara, Chiba 290-0067, Japan
cNCC Nano, LLC, 200-B Parker Drive, Suite 580, Austin, TX 78728, USA
First published on 12th February 2014
To avoid high temperatures and long curing times, both of which are impractical in the manufacture of flexible printed electronic devices, we fabricated new electrically conductive adhesives using vinyl ester resin and silver micro-flakes and introduced an intense pulse of light to cure the adhesives under an ambient atmosphere at room temperature. The electrically conductive vinyl ester resin–silver micro-flake adhesives can absorb intense pulsed light, which initializes the double bonds in the resin to successfully achieve crosslinking and curing. This curing process, known as photonic curing, can be completed within a second under an ambient atmosphere at room temperature, over a large area. A typical curing time was 140 ms without any photosensitizers or photoinitiators in the adhesives. The cured conductive adhesives had low bulk resistivity, e.g., 7.54 × 10−6 Ω cm and high bonding strength, e.g., 6.75 MPa. Thus, the combination of photonic curing and electrically conductive vinyl ester resin–silver micro-flake adhesives has great potential for printed electronics, which require low temperature and fast processes based on flexible devices.
For printed electronics, many high-speed sintering systems, such as electrical,38,39 laser,40,41 microwave,42,43 and photonic curing,44,45 also refereed to as flash light46,47 or intense pulsed light,48–50 have been developed to replace conventional heat sintering processes which take between a few minutes to a few hours. Among them, the photonic curing technique can sinter and cure materials in an ambient atmosphere over a large area almost instantly – from microseconds to a few seconds. This technique plays an important role in roll-to-roll printing processes of rapid and eco-friendly electronic device manufacturing and can achieve higher throughput than any other sintering technique in printed electronics. So far there are no reports on using photonic curing to cure ECAs because heat curing and ultraviolet ray curing are still the mainstream methods for the application of ECAs. Therefore, in this study, we fabricated ECAs using a vinyl ester resin and silver micro-flakes, and then introduced an intense pulsed light to cure them (Scheme 1). We investigated the curing, thermal, electrical and mechanical properties, and surface morphologies using Fourier transform infrared spectroscopy (FTIR), differential scanning calorimetry (DSC), thermogravimetric-differential thermal analysis (TG-DTA), field emission scanning electron microscopy (FE-SEM), a four-point probe method, nanoindentation, and a shear test.
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Scheme 1 Preparation of ultra-fast photonically cured ECAs: (a) fabricating ECAs, (b) printing ECAs, (c) setting samples, (d) irradiating and sintering, and (e) photonically cured ECAs. |
In this study, the matrix resin and silver micro-flakes showed excellent light-absorbing properties. Both presented strong, sharp absorption peaks at wavelengths of 200–300 nm on the UV-Vis-NIR spectra (Fig. S3†). Under intense pulsed light, ECA-80 absorbed the heat produced from the light, which was then transferred to the whole matrix resin system. During this transfer, the heat opened the double bonds at the end of molecular chains and caused crosslinking to accomplish the curing process. During irradiation and sintering, the temperature caused by the intense pulsed light could be up to 200 °C, which accelerated the opening and crosslinking processes. Therefore, the intense pulsed light, combined with a high radiant exposure energy (2.38 J cm−2) and a long pulse duration (1400 μs), had given enough activation energy to the matrix resin and opened the double end bonds to initialize crosslinking, polymerization, and curing49–51 [Scheme 1(d)–(e)].
As the number of light pulses increased from 5 to 300 pulses, the absorption peaks at 1635, 1415, 985, and 805 cm−1, which represented the characteristics of alkenyl groups in the matrix resin, became weak, and ultimately disappeared. These variations indicated the conversion process of double bonds during curing. The double bond conversion can be calculated using the following equation:52–54
Fig. 3 shows the double bond conversion of ECA-80 vs. curing time. They were 4.87% (5 pulses), 15.59% (20 pulses), 47.24% (40 pulses), 54.57% (50 pulses), 67.02% (60 pulses), 80.68% (80 pulses), 94.36% (100 pulses), 97.01% (200 pulses), and 99.38% (300 pulses), respectively. The double bond conversion increased sharply between 5 to 100 pulses, then showed a slow increasing trend between 200 to 300 pulses. This suggested that ECA-80 could be cured well at 100 pulses.
In addition, we also used DSC to characterize the curing degree of the photonic curing. As Fig. 4 shows, ECA-80, photonically cured at 100, 200, and 300 pulses, did not present any endothermic peaks within the testing temperatures (40–300 °C). This indicated that the ECAs were cured well at these pulses, corresponding to the curing times of 140, 280, and 420 ms, respectively, which also coincided well with the aforementioned FTIR results.
Fig. 5 displays the TG-DTA traces of the cured ECA-80, ECA-85, and ECA-90. As shown in Fig. 5(a), the TG traces revealed a loss of the matrix resin; the total weight loss was about 17% (ECA-80, 100 pulses), 14% (ECA-85, 100 pulses), 10% (ECA-90, 100 pulses), 8% (ECA-80, 500 pulses), 6% (ECA-85, 500 pulses), and 4% (ECA-90, 500 pulses) at the temperatures up to 900 °C. The weight loss increased quickly from about 350 to 450 °C, where the pyrolysis rate was the maximum. At temperatures higher than 450 °C, the weight loss was slow. The high pyrolysis temperature above 350 °C suggested that these ECAs all had high temperature stability. The weight losses of ECA-80, ECA-85, and ECA-90 at 500 pulses were less than those at 100 pulses. This is because the intense pulsed light produced too much energy over a long curing time, which caused the pyrolysis of the matrix resin under an ambient atmosphere.
Fig. 5(b) shows the DTA traces of ECA-80, ECA-85, and ECA-90 at 100 and 500 pulses. They all had an endothermic peak in the range of 350–450 °C. The shape, intensity, and area of these endothermic peaks changed accordingly with the weight losses of ECA-80, ECA-85, and ECA-90. The higher the weight loss, the sharper, stronger, and larger the endothermic peak. At 100 pulses, the weight losses of ECA-80, ECA-85, and ECA-90 were approximately equal to the weight percentages of the matrix resin in them. From the weight loss and endothermic peaks, it can be seen that the ECAs achieved good curing with negligible pyrolysis of the matrix resin using 100 pulses irradiating and sintering energy with 140 ms under an ambient atmosphere. Compared to heat curing for 30–60 min at 120–150 °C, or curing with ultraviolet rays for several to tens of minutes, intense pulsed light curing was ultra-fast. Importantly, there was only one weight loss step and one endothermic peak for each ECA, which indicated that a crosslinked homogeneous polymer had been formed from the matrix resin by the intense pulsed light [Scheme 1(e)], with no residual monomers or small molecules. Combining the double bond conversion and weight loss, we set the curing time of the ECAs as 100 pulses in this study.
Bulk resistivity has a close relationship to the content of the electrically conductive fillers; the higher the content of electrically conductive fillers, the lower the bulk resistivity. This is because the increasing electrically conductive fillers form more electrically conductive channels, which decrease the bulk resistivity. AgC-239 silver micro-flakes had a more significant effect on decreasing bulk resistivity than the AgC-224 silver micro-flakes. As shown in Fig. 6, the bulk resistivity was 1.85 × 10−5, 1.41 × 10−5, and 7.54 × 10−6 Ω cm, respectively, for ECA-80, ECA-85, and ECA-90 fabricated from AgC-239 silver micro-flakes, and 4.78 × 10−5, 3.27 × 10−5 and 2.44 × 10−5 Ω cm for those fabricated from AgC-224 silver micro-flakes. In addition, the bulk resistivity values for AgC-239 silver micro-flakes were also much lower than those at 3 × 10−5 to 5 × 10−5 Ω cm in our previous studies.6,10,11,16,17
The formation of electrically conductive channels (also called electrically conductive networks) in the ECAs mainly came from the contact points and areas between/among electrically conductive fillers; the greater the number of contact points, the larger the contact area, and the higher the electrical conductivity. To obtain clear profiles of electrically conductive channels, ECA-90 from AgC-239 and AgC-224 silver micro-flakes was irradiated and sintered for 500 pulses. After this process, the matrix resin was pyrolysed almost completely; there were only silver micro-flakes left in the ECAs. Thus, the electrically conductive channels were formed by sintered structures [Fig. 7(a) and (b)]. The shape and size of the silver micro-flakes greatly influenced the formation of electrically conductive channels. AgC-239 silver micro-flakes had a size of 2–15 μm [Fig. 1(a)], and AgC-224 silver micro-flakes had a size of 6–12 μm [Fig. 1(b)], so that the former had a wider size distribution than the latter. Their shapes were also different.
As Fig. 7(a) shows, AgC-239 silver micro-flakes overlapped and contacted each other to form a dense and fine electrically conductive network. The interspaces and holes between/among the AgC-239 silver micro-flakes were caused by the pyrolysis of the matrix resin. They were very small. A similar electrically conductive network was also formed from the AgC-224 silver micro-flakes, but was sparse and rough [Fig. 7(b)]. Moreover, the interspaces and holes between/among the AgC-224 silver micro-flakes were very large. Fig. 7(c) shows the cross-sectional morphology of ECA-90 fabricated from the AgC-239 silver micro-flakes after 100 pulses. It can be seen that the AgC-239 silver micro-flakes were densely dispersed and arranged tightly in the matrix resin, while the morphology of ECA-90 fabricated from the AgC-224 silver micro-flakes did not look like this. As shown in Fig. 7(d), the AgC-224 silver micro-flakes were evenly dispersed in the matrix resin, but not as densely or tightly as the AgC-239 silver micro-flakes. Fig. 7(e) and (f) present the arrangement models of the AgC-239 and AgC-224 silver micro-flakes in ECA-90. The arrangement of the AgC-224 silver micro-flakes [Fig. 7(f)] had many large interspaces and holes, representing that these silver micro-flakes did not contact each other fully, and the electrically conductive channels were not well formed. Thus, the bulk resistivity showed high values. The arrangement of the AgC-239 silver micro-flakes was not like that of the AgC-224 silver micro-flakes [Fig. 7(e)]. Small silver micro-flakes were filled or embedded into the interspaces and holes formed by large ones, to produce many contact points and increase contact areas. Electrically conductive channels were well formed due to this arrangement, leading to low bulk resistivity.
Fig. 8(a) presents the shear strength of ECA-80, ECA-85, and ECA-90 obtained from the shear test. These shear strength values at 6.75, 6.25, and 5.00 MPa were higher than some previously reported results at 4–11 MPa.6,10,11,33,34 The intense pulsed light, combining a high bank voltage (220 V), long pulse duration (1400 μs), and high radiant exposure energy (2.38 J cm−2), was used to cure these ECAs. The matrix resin and silver micro-flakes firstly absorbed the light and the heat produced from light, which were then transferred into the whole matrix resin system [Fig. 8(b)]. With the heat, the double bonds at the end of the molecular chains were initialized into crosslinking and polymerization, and then cured the ECAs as previously reported.51–54 The process also caused the pyrolysis of the matrix resin and sintered silver micro-flakes together [Fig. 7(a) and (b)].
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Fig. 8 (a) The shear strength of ECA-80, ECA-85, and ECA-90 from photonic curing (500 pulses) and (b) a light and heat transfer diagram. |
The matrix resin was connected via opened double bonds and crosslinked into macromolecules as reflected in the FTIR spectra. Moreover, the main molecular chains of the matrix resin contained hydroxyl, carbonyl, and epoxy groups. They were induced to form intermolecular hydrogen bonds [Fig. S4(a)†]. In addition, hydrogen bonds were also formed between AgC-239 silver micro-flakes and crosslinked macromolecules of bisphenol A epoxy acrylate [Fig. S4(b)†] and ethoxylated bisphenol A diacrylate [Fig. S4(c)†], because the coated fatty acid on the silver micro-flakes had these functional groups, too. In a word, good curing, sintered silver micro-flakes, and hydrogen bonds all contributed to the high shear strength of the photonically cured ECAs.
It can also be seen that the mechanical strength of the ECAs was reduced with increasing silver micro-flake content due to cutting off the crosslinked structures within the matrix resin. Fig. 9 presents the surface morphologies of pushed fracture interfaces on glass substrates and chips. The pushed fracture interfaces on glass substrates all looked flat. Those at ECA-80 had the most collapses and potholes [Fig. 9(a)], followed by ECA-85 [Fig. 9(c)], and finally, ECA-90 had few collapses and potholes [Fig. 9(e)]. The pushed fracture interfaces on glass chips were made up of torn particles, torn traces, collapses, and potholes, showing a decreasing rough state from ECA-80 [Fig. 9(b)] to ECA-85 [Fig. 9(d)], and to ECA-90 [Fig. 9(f)].
In short, the sandwiched ECA films were cracked from side to side, from the glass substrate (bonding interface) to the glass chip (bonded interface), to form these surface morphologies. The pushed fracture interfaces on glass chips were much rougher than those on the glass substrates. The surface roughness decreased visually as the weight percentage of silver micro-flakes increased from 80% to 90%. Moreover, solid-to-solid contacts among the glass substrate, ECA, and glass chip increased accordingly as silver micro-flakes increased in the ECAs, which also reduced the mechanical strength. Because of the variations in the surface morphologies, surface roughness, and solid-to-solid contact, the shear strength of the ECAs decreased as the weight percentage of silver micro-flakes increased from 80% to 90% in the ECAs [Fig. 8(a)].
We also used nanoindentation to study the nano-dynamic mechanical properties of the ECAs. The photonically cured ECA-80 at 100 pulses (Fig. S1†) was polished mechanically using an ECOMET 300 variable speed grinder-polisher (Buehler, Lake Bluff, IL, USA). Fig. S5† presents the polished cross-section of the samples. The thickness of the cured ECA film was about 50 μm on the glass substrate. The storage and loss moduli at different depths in the ECA film were obtained using a nanoindentation technique. As shown in Fig. 10(a), the storage modulus at a position of 0–32 μm was for the ECAs, and that at 32–40 μm for the glass substrate. In the range of 0–32 μm, the matrix resin showed a low storage modulus around 7 GPa at positions of 7–14, 16–17, 22–24, and 27–32 μm; other storage modulus peaks in this range were caused by silver micro-flakes [Fig. 10(b)]. Fig. 10(c) shows the loss storage modulus. As with the storage modulus, the silver micro-flakes also caused the loss modulus peaks in the range of 0–32 μm [Fig. 10(d)]; the matrix resin displayed a low loss modulus around 1.9 GPa, and that at 32–40 μm was for the glass substrate. The matrix resin presented the same storage and loss moduli at different positions (or depths), as indicated by the dashed lines marked in Fig. 10(a) and (c). This phenomenon also suggested that these ECAs were crosslinked and cured uniformly at 100 pulses, which coincided well with the FTIR spectra (Fig. 2), double bond conversion (Fig. 3), DSC curves (Fig. 4), and TG-DTA traces (Fig. 5).
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Fig. 10 (a) Storage modulus, (c) loss modulus, (b) and (d) tested cross-sections of photonically cured ECA-80 (100 pulses). |
Furthermore, the ECAs fabricated in this study were stored at room temperature, avoiding light. There was no gel, separation, delamination, or curing during the storage. They had storage times as long as that of the matrix resin, which were far superior to existing ECA products needing frozen storage. With the ultra-fast curing under intense pulsed light, low bulk resistivity, high mechanical strength, long storage time at room temperature, no other additives, and easy use, these ECAs are bound to have a good application prospect in printed electronics, which need low temperature and fast processes.
Footnote |
† Electronic supplementary information (ESI) available: Diagrams and UV-Vis-NIR spectra. See DOI: 10.1039/c4ra00292j |
This journal is © The Royal Society of Chemistry 2014 |