Lijuan
Shen
,
Ruowen
Liang
,
Mingbu
Luo
,
Fenfen
Jing
and
Ling
Wu
*
State Key Laboratory of Photocatalysis on Energy and Environment, Fuzhou University, Fuzhou 350002, P. R. China. E-mail: wuling@fzu.edu.cn; Tel: +86 591 83779105
First published on 3rd November 2014
UiO-66-X (X = H, NH2, NO2, Br) have been successfully synthesized and tested for their photocatalytic activity in water treatment. Results show that electronic effect of the ligand substituents greatly affects the photocatalytic activity of UiO-66. The rates obtained by different substituents are linearly correlated with their Hammett coefficients.
Toward this goal, herein, we have embarked on a detailed study of the structure–photoactivity relation with an isoreticular series of MOFs UiO-66-X (X = H, NH2, NO2, Br) (Fig. S1, ESI†) and firstly showed that the electronic effect of the ligand substituents has a systematic and important impact on the photocatalytic activity of the MOFs. UiO-66 and its functionalised compounds are zirconium-based microporous MOFs, which built from Zr6O4(OH)4 oxoclusters related together by 1,4-benzene-dicarboxylate linkers (Fig. S2, ESI†). These materials stand out among the numerous MOFs due to their high stability.39,40 Moreover, recent studies have proved that the UiO-66 series behave as semiconductors when exposed to light, making them unique platforms for light harvesting and photoinduced catalysis.41–44
UiO-66 was prepared by the method reported earlier.34 UiO-66-X (X = NH2, NO2 and Br) were synthesized analogously by replacing terephthalic acid (H2BDC) with equivalent molar amounts of H2N–H2BDC, O2N–H2BDC and Br–H2BDC, respectively. X-ray powder diffraction (XRD) has been used to evaluate the crystallinity and structural topology of UiO-66-X (X = H, NH2, NO2 and Br). As shown in Fig. 1, all materials are crystalline, although no single crystals have been formed. The XRD pattern of the UiO-66 is in good agreement with the previous report.27 It is worth noting that in many cases, introduction of functional groups into the organic scaffold would alter the topology of the desired MOFs. Fortunately, comparison between the diffraction patterns of the parent UiO-66 and those of the functionalised samples demonstrates the formation of pure, topologically equivalent phases for UiO-66-X (X = NH2, NO2 and Br).
The presence of the introduced functional groups on the linkers has been further evidenced by characterizing the IR spectra on all the UiO-66-X samples, which also confirms that most of the free organic ligands and DMF molecules have been eliminated. Fig. S3 (ESI†) shows the comparison between the IR spectra of the parent UiO-66 and the UiO-66-X (X = NH2, NO2 and Br). The typical absorption modes of the NH2, NO2 and Br functional groups can be found, further confirming the effective functionalization of the linkers on each MOF, which is also consistent with previous reports.45,46 From these results coupled with the XRD analysis, it can be deduced that the functional groups (NH2, NO2 and Br) do not coordinate with metal ions but may be protruding into the empty space of the micropores.
Fig. S4 (ESI†) shows the N2 adsorption isotherm at 77 K measured on the synthesized UiO-66-X. All the samples are found to retain porosity despite the presence of different functional groups on the linker. The BET surface areas of UiO-66-X (X = H, NH2, NO2 and Br) are determined to be 1141.1, 732.2, 464.8 and 455.9 m2 g−1, respectively, suggesting the large surface areas of UiO-66-X. However, it is important to note that the surface area of the UiO-66 decreased after ligand substitution. The decrease in surface areas for the functionalised UiO-66 samples can be largely attributed to both the reduced free space available and an overall increased weight of the MOFs resulting from the introducing of the large and heavy functional groups.47
X-ray photoelectron spectroscopy (XPS) can be used as an exceptionally useful tool for providing information about the charged states of atoms in the molecule and probing the electronic effects of ligands.48,49 The curves in the Zr 3d region could be deconvoluted into two peaks for Zr 3d5/2 and Zr 3d3/2, respectively. Table S1 (ESI†) lists the Zr 3d5/2 binding energies for UiO-66 with different substituents. The XPS results for UiO-66(NH2) show a decrease in Zr 3d5/2 binding energy as compared to the UiO-66, demonstrating the electron-donating effect of the amino functional group. Comparison of UiO-66 with UiO-66-Br shows a 0.14 eV change due to the electron attracting ability of the bromine functional group. In particular, the shifts are pronounced for the UiO-66 bearing the nitro-group, as the electron-withdrawing ability of the para-ring substituents is increased, there is an increase in the Zr 3d5/2 and Zr 3d3/2 binding energies. These data are direct evidence for the effect of the substituents on the electronic nature at the metal centre.
Optical absorption of the UiO-66-X samples has been investigated using UV/vis spectroscopy (as shown in Fig. 2). The main absorption bands of UiO-66 are located in the UV region (ca. 320 nm), which could be attributed to ligand-to-metal charge transfer (LMCT). As expected, the presence of functional groups in the aromatic ring strongly affects the optical properties of the material. The absorption edges are around 450, 400 and 360 nm for UiO-66-X (X = NH2, NO2 and Br), respectively. For the sample of UiO-66-NH2, it shows an obvious red-shift in comparison with other samples. This is because when the amino-substituent is introduced to the ligand, it provides the lone pair of nitrogen for the interaction with the π*-orbitals of the benzene ring, donating electron density to the antibonding orbitals.50 This results in a higher HOMO level that brings absorption to the visible region. This characteristic absorption pattern suggests that the substitutions on the ligand narrow the band gap of UiO-66.
To get in-depth knowledge of the electronic effect of ligand substitution on the photocatalytic properties of MOFs, photocatalytic oxidation of As(III) over UiO-66-X was then carried out. Arsenic is believed to be one of the most toxic contaminants found in the environment and has attracted considerable attention from society and regulation authorities around the world.51–53 Long-term exposure to arsenic may cause cancer of the skin, lungs, urinary tract, kidneys and liver, and can also produce various other non-cancerous effects.54 Among various techniques, the semiconductor photocatalytic oxidizing transformation of As(III) to As(V) has been widely regarded as a promising technology.55 The photocatalytic oxidation of As(III) over UiO-66-X was investigated after a pre-setting of 60 min for achieving the adsorption–desorption equilibrium. Control experiments were first carried out to demonstrate the photocatalytic nature of the reactions. Taking photocatalytic oxidation of As(III) over UiO-66 as a testing reaction. As shown in Fig. S5 (ESI†), blank experiments in the absence of catalyst or light lead to no oxidation of As(III), which ensures that the reaction is driven by the photocatalytic process. Besides, experiment conducted in an inert N2-saturated atmosphere shows negligible photocatalytic activity, indicating that oxygen is the primary oxidant for the photocatalytic oxidation system. Fig. 3 displays the variations of As(III) concentrations (C/C0) in the photocatalytic process over UiO-66-X. It can be seen that all the samples show oxidation abilities toward As(III), the concentration of As(III) decreased with reaction time. Notably, the photocatalytic activity of UiO-66 can be drastically affected by the introduced substituents on the ligand. UiO-66-NH2 is by far the most active material, reaching full conversion after only 60 min. The reaction is first order oxidation abilities toward As(III) and the calculated rate constants are listed in Table 1. After the photocatalytic reaction, the UiO-66-X samples were recovered by filtration. As shown in Fig. S6 (ESI†), XRD patterns of the fresh and used UiO-66-X are almost the same, implying that the samples are stable during the reaction process.
UiO-66-X | K X [h−1] | LogKX/KH | σ |
---|---|---|---|
–H | 0.0266 | 0 | 0 |
–NH2 | 0.0417 | 0.3443 | −0.161 |
–NO2 | 0.00369 | −0.6747 | 0.71 |
–Br | 0.0128 | −0.3040 | 0.393 |
As we know, the liquid–solid heterogeneous photocatalysis reactions are surface physical–chemical processes.56 Theoretically, a larger specific surface area of the photocatalyst can accommodate more surface active sites and facilitate the transport of charge carriers, which is expected to show positive effects on the reaction. However, in our case, the BET surface areas of the samples follow the order of UiO-66-H > UiO-66-NH2 > UiO-66-NO2 > UiO-66-Br. While the reaction rates are found to follow the order: UiO-66-NH2 > UiO-66 > UiO-66-Br > UiO-66-NO2. We further normalized the photocatalytic reaction rates of As(III) oxidation with the surface areas. As shown in Table S2 (ESI†), the order of the normalized rates is consistent with the original ones, indicating that the surface area could not be the decisive factor that determines the photocatalytic activity of the UiO-66-X. Moreover, in view of the significant difference in the optical spectra of UiO-66 and UiO-66-X, we envision that the extended absorption capability may be beneficial for improving the photocatalytic performance. Unexpectedly, the band gaps of the UiO-66-X still cannot correlate with their photocatalytic activities. These results are difficult to be explained by employing the conventional photocatalysis theory, suggesting that other explanations have to be sought. We attempt to correlate the activity to electronic effects of the linkers using Hammett's σm values. The Hammett constant represents the effect that different substituents have on the electronic character of a given aromatic system.57 A positive value of σ indicates an electron-withdrawing group and a negative value an electron-donating group. Apparently, an excellent correlation is found by plotting logKX values from Table 1versus the σm values (as shown in Fig. 4), confirming the influence of the electrophilic nature of the substituent on the photocatalytic oxidation of As(III) to As(V).
Fig. 4 Hammett plot for oxidation of aqueous As(III) with UiO-66-X (X = H, NH2, NO2 and Br) catalysts. |
To check whether these trends are general, the reduction of Cr(VI) over UiO-66-X has also been studied. As can be observed from Fig. 5, similar to the case of photocatalytic oxidation of As(III), a large rate increase is realized when the electron-donating NH2 functional group is introduced, while the introduction of the Br and NO2 groups attenuates the reactivity of the UiO-66. This can be attributed to the fact that, zirconium–oxygen clusters within UiO-66-X have been identified as the active sites, which are spaced out by organic ligands. The introduction of functional groups into the organic scaffold affects the electron density around the metal centre. The higher electron density caused by the electron-donating functional group would promote the separation and transfer of photogenerated charge carriers, and hence improves the photocatalytic activity of the sample. These observations prove that the ruling factor affecting the photocatalytic activity of UiO-66-X is due to the electronic effect, rather than to the surface area and band gap of the sample.
Footnote |
† Electronic supplementary information (ESI) available: Detailed experimental process and characterization. See DOI: 10.1039/c4cp04162c |
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