Ah Dhahri*ab,
E. Dhahrib and
E. K. Hlilc
aFaculté des Sciences, Monastir, Université de Monastir, Avenue de l'environnement 5019, Monastir, Tunisia
bLaboratoire de Physique Appliquée, Faculté des Sciences de Sfax, Université de Sfax, 3000, BP 1171, Tunisia. E-mail: Dhahri.ahmad@gmail.com; Tel: +216 20 20 45 55
cInstitut Néel, CNRS et Université Joseph Fourier, B.P. 166, 38042 Grenoble, France
First published on 1st March 2018
An La0.6Gd0.1Sr0.3Mn0.75Si0.25O3 ceramic was prepared via a solution-based chemical technique. X-ray diffraction study confirms the formation of the compound in the orthorhombic structure with the Pnma group space. Dielectric properties have been investigated in the temperature range of 85–290 K with the frequency range 40 Hz to 2 MHz. The conductivity spectra have been investigated by the Jonscher universal power law: σ(ω) = σdc + Aωn, where ω is the frequency of the ac field, and n is the exponent. The deduced exponent ‘n’ values prove that a hopping model is the dominating mechanism in the material. Based on dc-electrical resistivity study, the conduction process is found to be dominated by a thermally activated small polaron hopping (SPH) mechanism. Complex impedance analysis (CIA) indicates the presence of a relaxation phenomenon and allows us to modelize the sample in terms of an electrical equivalent circuit. Moreover, the impedance study confirms the contribution of grain boundaries to the electrical properties.
Recently, direct current (dc) and alternating current (ac) transport processes have been investigated in low-hole-doped Ln-based manganite-type perovskites such as La1−xCaxMnO3,16 La1−xSrxMnO3,17 La1−xAxMn1−yFeyO3,18 La0.7Sr0.25Na0.05Mn0.9Ti0.1O3,19 La0.5Ca0.5−xAgxMnO3,20 Pr0.67A0.33MnO3 (ref. 21) and RMnO3 (R = Eu; Gd; Tb; and Dy),22 where manganese is in a mixed valence state (Mn3+–Mn4+). Pairs of Mn4+ and Mn3+ can be controlled by changing the doping level or oxygen stoichiometry. Therefore, it seems plausible that the doping element and its content will be important for the electrical properties in these materials. To optimize the properties of this material, a systematic study of the electrical properties should be conducted over a wide temperature range and with different doping levels. Therefore, several investigations have been carried out to understand the correlation among the structure, magnetic and electrical properties, and the magnetoresistance of Re1−xMxMnO3 by doping with elements such as Cr, Ni, V, Ga, Co, Mg and Al at the Mn site.23–25 However, doping of silicon at the Mn site in Re1−xMxMnO3 (where Re = La, Nd, Pr, Sm, Y, … and M = Pb, Ba, Sr, Ca, …) has not been investigated so far. Therefore, to better understand the role of Mn and its local environment in La0.6Gd0.1Sr0.3MnO3, we have studied the effects of replacing some of Mn with Si. To decrease the critical temperature Tc (Tc = 378 K)26 of the parent compound La0.7Sr0.3MnO3, we have substituted lanthanum (La) with 10% gadolinium (Gd). The choice of the ion Si4+ is based on the fact that the ionic radius (0.4 Å) is smaller than that of Mn4+ (0.53 Å). In view of this information, the authors have taken up the present research with an objective to study the effect of silicate at the Mn site on the transport and dielectric properties of La0.6Gd0.1Sr0.3Mn0.75Si0.25O3. In the present study, we investigate the dielectric and electrical properties of La0.6Gd0.1Sr0.3Mn0.75Si0.25O3 at different temperatures (77 K to 320 K) and frequencies (40 Hz to 10 MHz). Impedance spectroscopy is successfully employed to obtain clear information about the transport and dielectric properties of this material. Such technique can resolve the conduction components from polycrystalline electrical ceramics, particularly in differentiating the transport characteristics in grains and grain boundaries.
Fig. 1 EDX spectra of the La0.6Gd0.1Sr0.3Mn0.75Si0.25O3 compound. The inset shows a typical scanning electron micrography (SEM) image. |
Typical La | Cationic Gd | Composition Sr | From Mn | EDX Si | Nominal composition |
---|---|---|---|---|---|
0.61 | 0.11 | 0.31 | 0.74 | 0.26 | La0.6Gd0.1Sr0.3Mn0.75Si0.25O3 |
The SEM image of the fractured surface of the Si-doped sample (inset of Fig. 1) reveals the presence of a large distribution of grains that connect with each other. The average grain size in the sample is estimated to be about ∼120–126 nm. The presence of the microstructural characteristics can be related to the matter transport mechanism between the grains during the sintering process.
The average crystallite size values have been estimated from the full width at half maxima of the X-ray diffraction peaks. The effects of synthesis and instrumental and processing conditions have been taken into consideration while making the calculation of crystallite sizes. The broadening of the Bragg reflections due to micro strains is considered to have angular dependence and is given by: βstrain = 4εtanθ, where βstrain is the peak shift due to the strain, is a coefficient related to the strain and θ is the Bragg angle. The micro strains include the effects of structural defects such as dislocations, stacking faults, twin boundaries, and inter growths. The dependence of the size effect is given by the Scherer formula: , where K is the grain shape factor (for a spherical grain K = 0.89), λ is the wavelength of the X-rays used (λ = 1.5406 Å), DSc is the crystal thickness and θmax is the corresponding incident angle. The value of (DSc) is 30 nm. In the present investigation, only the prominent peaks have been considered. The instrument broadening effect has been eliminated by subtracting the full width at half maxima (β0) values from the β size at respective Bragg peaks of a standard Si sample. Finally, the complete expression for the full width at half maximum (FWHM) of the X-ray diffraction peaks is given by: . A plot between βhklcosθ and sinθ gives a straight line, and from the value of the intercept on the y-axis, the average crystal size is calculated and is found to be 45 nm. The crystallite size, calculated in the present system using the Williamson–Hall technique, is larger as compared to the crystallite size from the Debye–Scherer method (DSc) because the broadening effect due to the strain (ε = 0.14%) is completely excluded in the Debye–Scherer technique. Obviously, the particle sizes observed by SEM are several times larger than those calculated by XRD, which indicates that each particle observed by SEM consists of several crystallized grains.28 Fig. 2 shows the X-ray diffraction patterns of LGSMSiO at room temperature. The sample is single phase without detectable secondary phases within the sensitivity limits of the experiment (a few percent). The structure refinement is performed in the orthorhombic setting of the Pnma (Z = 4) space group (no. 62) (inset of Fig. 2) in which the (La/Gd/Sr) atoms are at 4c (x, 0.25, z) position, (Mn/Si) atoms are at 4b (0.5,0,0) position, O(1) is at 4c (x,0.25, z) position and O(2) is at 8d (x, y, z) position. Table 2 summarizes the relevant structural parameters obtained by the Rietveld analysis of the powder XRD pattern. This table also reports the residuals for the weighted pattern Rwp, the pattern Rp, the structure factor RF and the goodness of fit χ2. The tolerance factor, which is the geometric measure of size mismatch of the perovskite: , is equal to 0.95 and is in the stable range for the perovskite structure 0.75 < t < 1.02.29
LGSMSiO | Space group | Pnma |
---|---|---|
a Density (exp.): . Density(theor.). | ||
Cell parameters | a (Å) | 5.4563(2) |
b (Å) | 7.7241(3) | |
c (Å) | 5.4961(5) | |
V (Å3) | 231.63 | |
Atoms | La/Gd/Srx | 0.0031(6) |
z | 0.0046(2) | |
Biso (Å2) | 0.32(3) | |
Mn/Si Biso (Å2) | 0.26(3) | |
(O1)x | 0.4837(2) | |
y | 0.963(6) | |
Biso (Å2) | 1.75(2) | |
(O2)x | 0.31(1) | |
y | 0.0019(5) | |
z | 0.681(3) | |
Biso (Å2) | 1.82(2) | |
Structural parameters | dMn–O1 (Å) | 1.966(4) |
θMn–O1–Mn (°) | 160.12(2) | |
dMn–O2 (Å) | 1.962(1) | |
θMn–O2–Mn (°) | 166.88(3) | |
〈dMn–O〉 (Å) | 1.964(4) | |
〈θMn–O–Mn〉 (Å) | 163.50(5) | |
Density (theo.) (g cm−3) | 6.35 | |
Density (exp.) (g cm−3) | 6.223 | |
Compactness: C | 0.98 | |
Agreement factors | Rp (%) | 3.55 |
Rwp (%) | 2.12 | |
RF (%) | 2.75 | |
χ2 | 1.65 |
The percentage of orthorhombic deformation, D%, can be obtained using the formula:30
The experimental density is determined from the weight and geometrical dimensions of the cylindrical pellets and then compared to the theoretical density. The compactness is thus calculated as the ratio. Table 2 shows the values of ρexp, ρtheor and C.
σ(ω) = σdc + Aωn | (1) |
Fig. 3 shows the variation of AC conductivity as a function of frequency at different temperatures of the La0.6Gd0.1Sr0.3Mn0.75Si0.25O3 sample. It is characterized by the following points: (i) a plateau region at low frequencies corresponds to σdc. In this frequency region, the conductivity, σdc, increases with the increasing temperature. Such behavior indicates that the electrical conductivity in the material is a thermally activated process. (ii) At high frequency, the conductivity is governed by Aωn, where n is a constant and ω is the angular frequency. According to Jonscher, the origin of the frequency dependence of conductivity can be due to the relaxation phenomena of the ionic atmosphere arising from the mobile charge carriers.33 The experimental conductivity spectra of the sample are fitted using eqn (1). The fitting results are summarized in Table 3. From this table, we can conclude that the exponent n increases with the increasing temperature. This change of n with temperature corresponds to a thermally activated process. The temperature dependence of n gives information to specify the suitable mechanism involved for the AC conductivity. In most cases, the frequency exponent, n, is found to be between 0.6 and 1 for ionic conducting compounds.34 In our study, n is lower than 1 for temperatures lower than T = 205 K. This can be attributed to the hopping conduction of mobile charge carriers over the barrier between two sites, which is similar to that observed in amorphous semiconductors and glasses.35 However, for temperatures above 205 K, n is larger than one. This may be attributed to the motion of mobile charge carriers from site to site with quantum mechanical tunneling between asymmetric double-well potentials as is proposed by K. S. Gilroy et al.36 The inset of Fig. 4 represents an illustration of this fitting for the temperature T = 85 K. It can be seen that the fit (red solid line) matches well with the experimental values. Fig. 4 shows the plots of the electrical resistivity (ρ) versus temperature deduced from the dc conductivity (σdc) using the following relation: . This curve indicates that this compound exhibits semiconductor behavior across all the studied temperature ranges. Fig. 5 shows the variation of dc conductivity (σdc) versus 103/T used for the calculation of activation energy, and the plot clearly obeys the Arrhenius relation σdc = σ0exp(−Eg/kBT), where σ0 is the pre-exponential factor corresponding to 1/T = 0, kB is the Boltzmann constant (=8.617 × 10−5 eV K−1), Eg is the conduction activation energy and T is the absolute temperature. For the sample, the activation energy (Eg) calculated from the slope of the graph is ∼(0.0383 ± 0.006) eV at 85–290 K.
Fig. 3 The variation at room temperature of the ac conductivity (σ) versus frequency for La0.6Gd0.1Sr0.3Mn0.75Si0.25O3. |
Temperature (K) | σdc (×10−5 Ω−1 cm−1) | A (×10−9) | n | R2 (%) |
---|---|---|---|---|
85 | 1.774 | 1.099 | 0.8856 | 99.99 |
95 | 3.218 | 7.907 | 0.8932 | 99.98 |
105 | 6.415 | 6.499 | 0.9165 | 99.99 |
115 | 12.670 | 3.785 | 0.9264 | 99.99 |
125 | 21.015 | 2.885 | 0.9322 | 99.99 |
135 | 37.727 | 5.751 | 0.9453 | 99.97 |
145 | 63.580 | 4.939 | 0.9561 | 99.99 |
155 | 96.416 | 1.328 | 0.9643 | 99.98 |
165 | 97.557 | 1.861 | 0.9723 | 99.99 |
175 | 250 | 3.584 | 0.9801 | 99.99 |
185 | 354 | 2.641 | 0.9857 | 99.99 |
205 | 535 | 4.361 | 0.9984 | 99.98 |
215 | 1145 | 7.914 | 1.0165 | 99.99 |
230 | 1723 | 2.021 | 1.0328 | 99.97 |
245 | 2140 | 7.812 | 1.0443 | 99.98 |
260 | 4054 | 9.342 | 1.0730 | 99.96 |
270 | 5173 | 5.898 | 1.1122 | 99.97 |
280 | 6486 | 3.425 | 1.1323 | 99.99 |
290 | 8112 | 2.547 | 1.2321 | 99.98 |
Inset of Fig. 5 shows the variation of σac with temperature at different frequencies. It was observed that σac increased with the increase in temperature, and it obeyed the thermally activated relation: σac = σ0exp(−Eg/kBT), where σ0 is the pre-exponential factor, kB is the Boltzmann constant, Eg is the activation energy and T is the absolute temperature.37 It was also seen that the slope of the curve decreased with the increase in frequency. This indicated a reduction in Eg with increase in frequency due to enhanced electronic jumps between localized states.37 Furthermore, a merge of all of the curves at high temperatures may be due to intrinsic conductivity of the material at these temperature regions.38
Fig. 6 Variation of M′ with frequency at different temperatures for the La0.6Gd0.1Sr0.3Mn0.75Si0.25O3 compound. The inset shows the variation of M′′ with frequency at different temperatures. |
Fig. 6 shows the variation of the real part of the electrical modulus ‘M’ versus frequencies at different temperatures. We can note a very low ‘M’ value (close to zero) in the low-frequency region that increases with the increasing frequency, ultimately approaching the M∞ value. This may be attributed to a conduction phenomenon due to short-range mobility of charge carries. Herein, the relaxation frequency (fmax) corresponding to the ‘M’ peak denotes the transition from long-range to short-range motion with the increasing frequency. The temperature dependence of the frequency fmax in the low-frequency side of the dielectric relaxation can be described by the Arrhenius law. Thus the activation energy (Erelax) is calculated from , where f0 is the pre-exponential term. Fig. 7 presents the variation of the logarithmic relaxation time log(τ) versus 103/T and log(fmax) versus 103/T in the temperature range of 85–215 K. The main values of the relaxation energy and the relaxation time obtained from the equation τ0 are 42.92 meV and 1.2 × 10−9 s, respectively.
Fig. 7 (a) Variation of logarithmic relaxation time log(τ) versus 103/T and (b) plot of log(fmax) versus 103/T. |
Fig. 8 shows the imaginary part of the impedance (Z′′) versus the real part (Z′) over a wide range of frequencies and at different temperatures. These plots are characterized by the appearance of semicircular arcs whose maxima decease with the increasing temperature. The appearance of a single semicircle at all the temperatures means that the electrical processes obey a single relaxation mechanism.42 The diameter of the semicircle decreases with the increasing temperature, demonstrating a pronounced increase in dc conduction. To interpret such a diagram, it is necessary to model the compound.43,44 The experimental data are fitted using the Zview software and the best fit (in Fig. 8, it is presented as a red solid line) is obtained when employing an equivalent circuit formed by a resistance R1 (grain resistance Rg) in series with a parallel combination of a constant phase element impedance (ZCPE) and resistance R2 (grain boundary resistance Rgb). The equivalent configuration is of the type (R1 + (R2//ZCPE)) as shown in the inset of Fig. 8. The values of all fitted parameters are tabulated in Table 4. As the grain resistance (Rg) is too weak, the total resistance (RT), which is the sum of grain and grain boundary resistances, is approximately equal to the grain boundary contribution.45
Fig. 8 Complex impedance spectrum (Nyquist plot) for the La0.6Gd0.1Sr0.3Mn0.75Si0.25O3 sample at different temperatures with the electrical equivalent circuit (see the inset). |
T (K) | R1 = Rg (Ω) | R2 = Rgb × 105 (Ω) | CPE (nF) | α |
---|---|---|---|---|
85 | 680.3 | 8.2857 | 0.228 | 0.836 |
95 | 658 | 2.995 | 0.2347 | 0.828 |
105 | 629 | 1.1684 | 0.549 | 0.825 |
115 | 550 | 0.5005 | 0.2842 | 0.821 |
125 | 465.3 | 0.2395 | 0.3568 | 0.819 |
135 | 461.12 | 0.1220 | 0.358 | 0.819 |
145 | 419 | 0.06760 | 0.3933 | 0.817 |
155 | 395 | 0.04220 | 0.999 | 0.815 |
175 | 384 | 0.01510 | 1.285 | 0.812 |
185 | 372 | 0.0123 | 1.448 | 0.806 |
215 | 366 | 0.0106 | 1.690 | 0.799 |
230 | 357 | 0.0102 | 1.978 | 0.798 |
245 | 251 | 0.0098 | 2.122 | 0.789 |
260 | 130 | 0.0085 | 2.462 | 0.796 |
270 | 92 | 0.0064 | 3.025 | 0.792 |
280 | 73 | 0.0058 | 3.326 | 0.798 |
290 | 60 | 0.0049 | 4.651 | 0.795 |
The grain boundary resistance decreases with the increasing temperature, indicating a semi-conducting behavior for the compound (Table 4). This result is in good agreement with that of ρ(T) curves (Fig. 4). Such behavior has also been reported in other studies.46 It is revealed that the effect of grain boundaries helps lower the barrier to movement of the load carriers, resulting in increased electrical transport with an increase in temperature.
Fig. 9 shows the variation of the real part of impedance (Z′) with frequency at different temperatures. It is clear from the Z′ = f(freq) curves that the impedance value is higher at lower temperatures in the low-frequency domain and then, it decreases gradually with the increasing frequency. It is seen that Z′ decreases with an increase in frequency, which signifies the enhancement of ac conductivity with the increase in frequency. Moreover, Z′ decreases with an increase in temperature. It is observed that Z′ values merge at the high frequency side, which is due to a possible release of space charge.47
Fig. 9 Variation of the real part of the impedance (Z′) of the La0.6Gd0.1Sr0.3Mn0.75Si0.25O3 sample as a function of frequency for different temperatures. |
The variation of the imaginary part of impedance (Z′′) of the La0.6Gd0.1Sr0.3Mn0.75Si0.25O3 sample as a function of frequency for different temperatures is shown in Fig. 10. It is found that the Z′′ value decreases with the increase in both temperature and frequency, and it shifts to higher frequencies as the temperature increases. This behavior describes both the type and the strength of the thermal relaxation processes in the material. This process is probably due to the presence of electrons and/or immobile species at lower temperatures and defects and vacancies at higher temperatures.47 The inset in Fig. 10a shows the normalized imaginary parts of the impedance as a function of frequency at the selected temperatures. The peaks are observed with a slight symmetric broadening at each temperature, especially at higher temperature. The asymmetric broadening of the peaks suggests the presence of electrical processes in the material with a spread of relaxation times.48
Fig. 10 Variation of the imaginary part of the impedance (Z′′) of the La0.6Gd0.1Sr0.3Mn0.75Si0.25O3 compound as a function of frequency for different temperatures. Inset: variation of with log(f). |
The position of these peaks allows for the determination of the relaxation frequency value (fmax) and the relaxation time (τ) using the relation: τ = 1/2πfmax. The variation of log(τ) versus 103/T is shown in Fig. 11. We can see that the value of τ decreases with the increase in temperature, which suggests a thermally activated process. The dynamics of the relaxation process can be analyzed by the mean relaxation time τ expressed by the Arrhenius law . This relaxation process is characterized by the activation energy (Ea) and a relaxation time (τ0) of about 41.7 meV and 1.55 × 10−9 s, respectively. The Ea value is in good agreement with that deduced from the modulus analysis, Erelax, which is about 42.92 meV. It is interesting to note that the energy deduced Erelax is equal to the activation energy Ea, which signifies that the relaxation process and therefore the electrical conductivity, is attributed to the effects of the grain boundaries. Indeed, the modulus analysis paragraph has reveals that the dielectric relaxation is assigned to the grain boundary effect.
Fig. 11 Variation of log(τ) versus 103/T for the La0.6Gd0.1Sr0.3Mn0.75Si0.25O3 sample. Red solid line is the linear fit for our data. |
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