Kodai Iijimaa,
Yann Le Galb,
Dominique Lorcyb and
Takehiko Mori*a
aDepartment of Materials Science and Engineering, Tokyo Institute of Technology, O-okayama 2-12-1, Meguro-ku, 152-8552, Japan. E-mail: mori.t.ae@m.titech.ac.jp
bUniv. Rennes, CNRS, ISCR (Institut des Sciences Chimiques de Rennes) - UMR 6226, F-35000 Rennes, France
First published on 21st May 2018
By introducing bulky 2-phenylethyl groups into sulfur-rich electron acceptors, 5,5′-bithiazolidinylidene-2,2′-dione-4,4′-dithione and 5,5′-bithiazolidinylidene-2,4,2′,4′-tetrathione, electron transport with the mobility of 0.27 cm2 V−1 s−1 with ambient and long-term stability is achieved in thin-film transistors. Bulky groups destroy the intermolecular S–S network, but the long-term transistor stability is maintained. Here, benzyl groups realize one-dimensional stacking structures, whereas 2-phenylethyl groups lead to herringbone structures.
Previously, we have reported remarkable transistor characteristics and air stability in n-type organic transistors of sulfur-rich acceptors, 3,3′-dialkyl-5,5′-bithiazolidinylidene-2,2′-dione-4,4′-dithione (OS-R) and 3,3′-dialkyl-5,5′-bithiazolidinylidene-2,4,2′,4′-tetrathiones (SS-R) (R = alkyl in Scheme 1).3,4 SS-R compounds show stronger electron acceptor ability than OS-R stemming from the stability of the thiolate units (S−) because the negative charges are largely located on the inner thiocarbonyl groups. SS-Pr shows the highest mobility of 0.26 cm2 V−1 s−1 among this series of materials, and achieves remarkable long-term stability even in the thin-film transistors. SS-R compounds form stacks with anisotropic two-dimensional carrier pathways. On the other hand, OS-R derivatives, which are easily available in a one-step reaction,5 are organized into herringbone structures. These different molecular packings are attributed to the reduced S–S intermolecular interactions in OS-R. OS-Et thin-film transistors exhibit similar performance to SS-Pr. This is likely to come from the isotropic two-dimensional carrier pathways in the herringbone packing.6 Transistors of SS-R maintain the performance for months, but OS-R transistors show slight degradation in air. Although SS-R is a stronger acceptor than OS-R, the excellent air stability has been ascribed to the extensive intermolecular S–S network in the SS-R compounds.3,4
Scheme 1 Molecular structures, where R = benzyl (Bn) and 2-phenylethyl (EtPh). Compounds with X = O and S are respectively abbreviated as OS-R and SS-R. |
We have reported that performance of transistors based on indigo is remarkably improved by the phenyl substitution.7 Similar enhancement has been achieved thanks to the presence of phenyl rings in thienoisoindigo series.8 In both cases, the improved performance is ascribed to the brickwork structure of the core parts as well as the herringbone arrangement of the phenyl rings. Note also that the presence of bulky substituents is not crippling; in p-type transistors based on TTF derivatives, tert-butyl substitution of hexamethylenetetrathiafulvalene (HMTTF) and dibenzo-TTF (DBTTF), improves the transistor properties due to closely packed organization.9 In the present work, we demonstrate the influence of phenylalkyl substitutions of OS-R and SS-R (Scheme 1). We can expect that such bulky substituents improve the performance and stability of the transistors.
The energy levels are estimated using cyclic voltammetry by measuring the redox potentials. In SS-Bn and SS-EtPh, the cyclic voltammograms clearly show two reversible reduction waves, while OS-Bn and OS-EtPh show only a single reversible reduction wave (Fig. 1(a) and (b)). The first half-wave potentials afford the lowest unoccupied molecular orbital (LUMO) levels (ELUMO) as shown in Table 1. The LUMO levels of SS-Bn and SS-EtPh are −4.29 and −4.28 eV, respectively. These values are approximately equal to the previous SS-R,4 indicating that the presence of the N-phenyl alkyl substituents do not significantly modify the electron accepting ability. Therefore, these derivatives are promising candidates to afford air-stable n-type transistor characteristics.12 The LUMO levels of OS-Bn and OS-EtPh are situated above −4.0 eV, as previously observed for other OS-R derivatives.4
E11/2 (V vs. Fc/Fc+) | E21/2 (V vs. Fc/Fc+) | LUMO (eV) | λedge (nm) | Optical gap (eV) | HOMO (eV) | |
---|---|---|---|---|---|---|
a The LUMO levels were estimated by assuming the reference energy level of ferrocene/ferrocenium to be 4.8 eV from the vacuum level.11 The HOMO levels were obtained from the LUMO levels and the optical gaps. | ||||||
OS-Bn | −0.94 | — | −3.86 | 485 | 2.56 | −6.42 |
OS-EtPh | −0.99 | — | −3.81 | 483 | 2.57 | −6.38 |
SS-Bn | −0.51 | −0.94 | −4.29 | 608 | 2.04 | −6.33 |
SS-EtPh | −0.52 | −0.93 | −4.28 | 607 | 2.04 | −6.32 |
The energy gaps are extracted from the ultraviolet-visible spectra (Fig. 1(c) and (d)). OS-Bn and OS-EtPh show larger gaps (2.6 eV) than those of SS-Bn and SS-EtPh (2.0 eV). The highest occupied molecular orbital (HOMO) levels are estimated by subtracting the optical gaps from the LUMO levels. The HOMO levels are located at approximately the same levels in OS-R and SS-R (Table 1).
After storage | Measurement | μmax (cm2 V−1 s−1) | μaverage (cm2 V−1 s−1) | Vth (V) | On/off ratio | |
---|---|---|---|---|---|---|
OS-Bn | Under vacuum | 7.2 × 10−3 | 6.7 × 10−3 | 11 | 5 × 105 | |
In air | 8.1 × 10−3 | 6.8 × 10−3 | 41 | 4 × 104 | ||
OS-EtPh | Under vacuum | 2.0 × 10−2 | 1.5 × 10−2 | 24 | 8 × 105 | |
In air | 1.4 × 10−2 | 1.1 × 10−2 | 52 | 6 × 105 | ||
SS-EtPh | Under vacuum | 0.18 | 0.13 | 26 | 1 × 107 | |
In air | 0.27 | 0.14 | 20 | 9 × 106 | ||
Three months in air | Under vacuum | 0.19 | 0.17 | 60 | 2 × 107 | |
In air | 0.20 | 0.17 | 55 | 2 × 107 |
Thin-film transistors of SS-Bn does not work even under vacuum. All the other transistors exhibit n-type transistor characteristics (Table 2). Transfer characteristics of an SS-EtPh thin-film transistor are shown in Fig. 2(e). The measurement in air affords the electron mobility of 0.27 cm2 V−1 s−1. The value is comparable to that of SS-Pr. Since the thin-film transistors of SS-EtPh are stable under ambient conditions, the aging stability is investigated. After stored three months in air, the mobility does not change, though the threshold voltage somewhat increases. In the transistors of SS-Pr, an increase of the off current is observed after the storage. In contrast, the off current of the transistors of SS-EtPh is unchanged. It should be noted that excellent stability is realized even in the thin-film transistors.
OS-Bn shows 10−3 order mobility under vacuum and in the ambient atmosphere. However, the threshold voltage and off current increase in air. OS-EtPh shows an order of magnitude higher mobility than OS-Bn. Only the threshold voltage increases in air. OS-Bn and OS-EtPh show improved stability in comparison with the previously reported OS-R. This may be due to the introduction of the bulky substituents.6
OS-Bn | OS-EtPh | SS-Bn | SS-EtPh | |
---|---|---|---|---|
a The value in the thin film is in the parentheses. | ||||
Formula | C20H14N2O2S4 | C22H18N2O2S4 | C20H14N2S6 | C22H18N2S6 |
Formula weight | 442.58 | 470.64 | 474.70 | 502.76 |
Crystal system | Monoclinic | Monoclinic | Monoclinic | Orthorhombic |
Space group | P21/n | P21/c | P21/c | Pccn |
Shape | Red needle | Orange plate | Dark purple needle | Dark purple plate |
a (Å) | 18.054(15) | 18.891(7) | 11.9840(3) | 23.6666(4) |
b (Å) | 4.977(5) | 6.409(3) | 4.79313(10) | 13.6498(2) |
c (Å) | 11.429(8) | 9.138(4) | 18.2901(4) | 7.17290(10) |
β (deg.) | 108.13(4) | 93.09(4) | 104.4657(11) | 90 |
V (Å3) | 976.0(14) | 1104.8(8) | 1017.29(4) | 2317.17(6) |
Z-value | 2 | 2 | 2 | 4 |
T (K) | 298 | 298 | 271 | 271 |
Dcalc (g cm−3) | 1.506 | 1.415 | 1.550 | 1.441 |
Total reflns. | 3588 | 2475 | 10789 | 24371 |
Unique reflns. (Rint) | 2830 (0.0611) | 1951 (0.1261) | 1860 (0.0495) | 2131 (0.0439) |
R1 [F2 > 2σ(F2)] | 0.0548 | 0.0660 | 0.0448 | 0.0353 |
wR2 [all reflns.] | 0.1652 | 0.2475 | 0.1389 | 0.093 |
GOF | 1.017 | 1.032 | 1.114 | 1.123 |
XRD d (Å) | 10.8 (001) | 19.0 (∼a) | 15.2 | 18.2 |
Tilt angle φ (°) | 33 | 24 | 18 | 50 (12)a |
SS-Bn has a stacking structure similar to OS-Bn (Fig. 3), but the adjacent columns are alternately tilted along the c axis because the space group is different from OS-Bn. The interplanar distance of SS-Bn (3.650 Å) is longer than that of OS-Bn, and the intrastack transfer integral (14.0 meV) is much smaller than that of OS-Bn. This is in agreement with the reduced transistor performance.
OS-EtPh has a herringbone structure similar to OS-R (Fig. 4). Owing to the ethylene group between the core part and the phenyl ring, the torsion angle is small (8°). The small steric hindrance allows OS-EtPh to form the ordinary herringbone structure similar to OS-R. The dihedral angle is 54°, which is smallest among OS-R. The small dihedral angle leads to a large transfer integral (p) of 22.0 meV.
SS-EtPh has a herringbone structure with a large dihedral angle of 126° (Fig. 4). The structure resembles the θ-phase structure observed in bis(ethylenedithio)tetrathiafulvalene (BEDT-TTF) salts.14 The torsion angle between the core part and the phenyl ring is as small as 6° similarly to OS-EtPh. The previous SS-R compounds have the tilted stacking structure. The large substituent inhibits the intermolecular short S–S contacts (<3.6 Å) to realize a herringbone structure. This is analogous to OS-R, where the weakened intermolecular interactions result in the herringbone structure.3 CH–S interactions exist along the p direction (Fig. S4†), but the transfer integral (p) is very small.
Fig. 5 (a) X-ray diffraction patterns of XS-R. Atomic force microscopy (AFM) images of (b) OS-Bn, (c) OS-EtPh, (d) SS-Bn, and (e) SS-EtPh. |
Atomic force microscopy (AFM) images of the present compounds show densely packed microcrystals (Fig. 5). In particular, SS-EtPh shows very good crystallinity and smooth packing. This is certainly related to the good transistor performance. SS-Bn shows exceptionally loose packing and poor crystallinity. This should be responsible for the absence of the transistor properties.
OS-EtPh maintains the usual herringbone structure similar to OS-R. OS-EtPh shows the mobility of the same order of magnitude as the previous OS-R. Phenylalkyl groups have a great influence upon not only the crystal structure but also the stability of the transistor operation. Degradation of the mobility in the ambient conditions, which has been observed in the previous OS-R, is not observed in OS-EtPh. 2-Phenylethyl groups disturb the intermolecular S–S interactions widely observed in SS-R, and SS-EtPh forms a herringbone structure. The thin-film transistors based on SS-EtPh exhibit the highest mobility of 0.27 cm2 V−1 s−1 among the birhodanine derivatives. Although the close intermolecular S–S contacts are largely reduced, this compound exhibits excellent stability of the transistors. The AFM image and the XRD peaks indicate high crystallinity. The d-spacing indicates that the molecules in the thin films are less tilted than the crystals, which is favorable to thin-film transistors.15 This is expected to show the significant improvement of the transistor properties, because the previous SS-R compounds show large tilt angles (∼30°). Accordingly, introduction of bulky substituents is a versatile strategy to improve the stability of the transistor performance.
Footnote |
† Electronic supplementary information (ESI) available: Additional information for preparative details, devices fabrication, transistor characteristics, crystal structures. CCDC 1835173–1835176. For ESI and crystallographic data in CIF or other electronic format see DOI: 10.1039/c8ra03362e |
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