Introducing the concept of pulsed vapor phase copper-free surface click-chemistry using the ALD technique

Abstract

We report for the first time on a pulsed vapor phase copper-free azide–alkyne click reaction on ZnO by using the atomic layer deposition (ALD) process technology. This reproducible and fast method is based on an in situ two-step reaction consisting of sequential exposures of ZnO to propiolic acid and benzyl azide.