Junxin Liu,
Yongze Liu,
Yajun Tian,
Li Feng* and
Liqiu Zhang*
Beijing Key Laboratory for Source Control Technology of Water Pollution, Engineering Research Center for Water Pollution Source Control and Eco-remediation, Beijing Forestry University, Beijing 100083, China. E-mail: fengli_hit@163.com
First published on 11th February 2020
UV/peroxydisulfate (PDS) and UV/hydrogen peroxide (H2O2) can effectively degrade halophenols (HPs, e.g., 2,4-bromophenol and 2,4,6-trichlorophenol); meanwhile, information about the discrepancies in the related degradation kinetics and mechanisms of these two processes is limited. To gain this knowledge, the degradation of two typical HPs (i.e., bromophenols and chlorophenols) in UV/PDS and UV/H2O2 processes were investigated and compared. The results showed that the degradation rates of HPs with different substitution positions in the UV/PDS process were in the order of para-substituted HPs (i.e., 4-BP and 4-CP) > ortho-substituted HPs (i.e., 2-BP and 2-CP) > meta-substituted HPs (i.e., 3-BP and 3-CP), while in the UV/H2O2 process, these rates were in the order of para-substituted HPs > meta-substituted HPs > ortho-substituted HPs. These discrepancies were ascribed to the different reaction activities of SO4˙− and HO˙ with HPs, which were calculated based on the competition method. Further density functional theory (DFT) calculations suggested that SO4˙− reacts more readily with HPs via electron transfer than HO˙. In the presence of water matrices (such as Cl−, HCO3− and natural organic matter (NOM)), the degradation of 2-BP in both UV/PDS and UV/H2O2 treatment processes was inhibited due to the scavenging of free radicals by these background substances. The degradation products and pathways further confirmed that SO4˙− is a strong one-electron oxidant that reacts with HPs mainly via electron transfer, while HO˙ reacts with HPs via electron transfer and hydroxyl addition.
Many HPs are recalcitrant contaminants, which are resistant to conventional biological and physico-chemical methods.11–13 In recent years, UV-based advanced oxidation processes (AOPs) have been widely applied to degrade refractory organic pollutants through oxidizing agents such as H2O2.14,15 The photolysis of H2O2 can generate hydroxyl radicals (HO˙, redox potential 2.73 V).16 Persistent organic pollutants (e.g., phenol, azo dyes and some pharmaceuticals) were reported to be degraded in the UV/H2O2 process via HO˙ oxidation.17 The formed HO˙ was demonstrated to have a fast reaction rate with HPs (k = 108 to 1010 M−1 s−1).18 Recently, the activation of peroxydisulfate (PDS) via UV photolysis has also been widely studied and applied in wastewater treatment.19 The sulfate radical (SO4˙−) generated in the UV/PDS process was demonstrated to be a strong oxidative radical with a redox potential of 2.60 V.16,20 Compared with HO˙-based AOPs, SO4˙− can react more rapidly with organic pollutants via electrophilic reactions.21 SO4˙−-based AOPs have also been proved to have the ability to remove HPs with a removal rate of 80–100% after 30 minutes of reaction.22 In a word, both HO˙- and SO4˙−-based AOPs can degrade HPs effectively. However, in most literature reports focused on the degradation efficiencies of HPs in UV/PDS and UV/H2O2 processes, the discrepancies in HP degradation between UV/PDS and UV/H2O2 are not systematically researched. Furthermore, information about the degradation differences of HPs by the above two types of free radicals, especially the difference in the oxidized active sites of HO˙ and SO4˙−, is limited.
In this study, to investigate the difference in the active sites of HPs between HO˙ oxidation and SO4˙− oxidation and to gain more thorough knowledge about the reaction mechanisms of HO˙ and SO4˙− oxidation, three bromophenols (BPs, 2-, 3-, and 4-BP) and three chlorophenols (CPs, 2-, 3-, and 4-CP) were selected as the target HPs. Firstly, the degradation kinetics of the HPs in UV/PDS and UV/H2O2 processes were comparatively examined; then, the active sites of the HPs were revealed based on density functional theory (DFT). In addition, the effects of the background matrix (such as pH, Cl−, HCO3−, and NOM) on the degradation behaviors in UV/PDS and UV/H2O2 were evaluated. Furthermore, the degradation products and pathways of HPs in both processes were proposed.
During the UV irradiation (30 min), 1.5 mL samples were withdrawn every five minutes (0, 5, 10, 15, 20, 25, 30 min). The samples were filtrated using 0.22 μm membranes (polyether sulfone, diam. 13 mm), and excess methanol was added to quench SO4˙− and HO˙. Then, the concentrations of the target contaminants were detected using high-performance liquid chromatography (HPLC). All of the experiments were carried out three times, and the results were averaged. All of the standard deviations were less than 5%.
In the competitive kinetics experiment, BA (10 μM) and HPs were added to the reaction system at the same time, and the second-order reaction rate constant was calculated by the competitive degradation kinetics during the UV/H2O2 process. TBA (10 mM) was added to the UV/PDS system to capture HO˙ to create a single SO4˙− system.
2-BP (pKa = 8.45) was selected to further investigate the effects of pH and the background matrix (i.e., Cl−, HCO3− and NOM) on the HP degradation behavior in UV/PDS and UV/H2O2. The reaction solution pH was adjusted to different levels (i.e., 4.0, 5.0, 6.0, 7.0 and 8.0) with perchloric acid and sodium hydroxide before irradiation to explore the effects of pH on the HP degradation. Specific volumes of stock Cl−, HCO3− and NOM solutions were added to the reaction solution to obtain different concentrations of Cl− (1, 5, 10, 100 and 500 mM), HCO3− (1 and 5 mM) and NOM (1, 5 and 10 mgC L−1) to study the influence of the water matrices on the HP degradation.
In order to analyze the degradation products, the concentration of 2-BP was increased to 1 mM. Accordingly, the concentrations of PDS and H2O2 were also increased to 20 mM. The pH of the solutions was still maintained at 7.0. The samples (30 mL) were withdrawn after UV irradiation at 0, 15 and 30 min, respectively. Then, the samples were concentrated via solid-phase extraction and examined by liquid chromatography-tandem mass spectrometry (LC-MS/MS).
The degradation products of 2-BP were analyzed by liquid chromatography-tandem mass spectrometry (LC-MS/MS). Chromatography was performed using a Waters BEH C18 (1.7 μM × 100 mm) column. The details of the test method are provided in Text S2.†
The HPs were degraded by direct photodegradation to a certain extent under UV irradiation (Fig. S1†); therefore, the observed rate constants (kobs) for degradation of the HPs comprised those of direct photolysis (kUV) and oxidation by radicals (kradicals), as described in eqn (1).25
kobs = S × kUV + kradicals | (1) |
It can be seen that the kobs of the HPs with different substitution positions in UV/PDS were in the order of para-substituted HPs (i.e., 4-BP and 4-CP) > ortho-substituted HPs (i.e., 2-BP and 2-CP) > meta-substituted HPs (i.e., 3-BP and 3-CP). The kobs of the HPs in the UV/H2O2 process were in the order of para-substituted HPs (i.e., 4-BP and 4-CP) > meta-substituted HPs (i.e., 3-BP and 3-CP) > ortho-substituted HPs (i.e., 2-BP and 2-CP), which is inconsistent with the order of the UV/PDS process.
In general, SO4˙− is the main active radical in the UV/PDS process, while the main active specie in the UV/H2O2 process is HO˙.26 Thus, in order to further investigate the differences in the degradation of HPs with different substitution positions, the second-order reaction rate constants of the six target HPs with SO4˙− and HO˙ were calculated by competition kinetics. BA was employed to carry out the competition kinetics experiments due to its negligible photolysis under UV irradiation, and TBA was employed to quench HO˙ in the UV/PDS process to obtain single SO4˙− oxidation. The second-order reaction rate constants of BPs with SO4˙− and HO˙ were calculated via eqn (2) and (3); here, the second-order reaction rate constants of BA with SO4˙− (kSO4˙−,BA) and HO˙ (kOH˙,BA) were reported to be 1.20 × 109 M−1 s−1 and 5.90 × 109 M−1 s−1, respectively.27
(2) |
(3) |
The calculated second-order reaction rate constants of BPs and CPs with SO4˙− and HO˙ are given in Table 1. The kSO4˙−,BP values were in the order of para-substituted HPs (i.e., 4-BP and 4-CP) > ortho-substituted HPs (i.e., 2-BP and 2-CP) > meta-substituted HPs (i.e., 3-BP and 3-CP). The kOH˙,HP values were in the order of para-substituted HPs (i.e., 4-BP and 4-CP) > meta-substituted HPs (i.e., 3-BP and 3-CP) > ortho-substituted HPs (i.e., 2-BP and 2-CP). Therefore, the different degradation rates of HPs with different substitution positions in the UV/PDS and UV/H2O2 processes can be attributed to their different reactivities with SO4˙− and HO˙.
Compound | SO4˙− (M−1 s−1) | HO˙ (M−1 s−1) |
---|---|---|
2-BP | 2.74 × 109 | 3.93 × 109 |
3-BP | 2.70 × 109 | 5.81 × 109 |
4-BP | 3.84 × 109 | 5.94 × 109 |
2-CP | 2.58 × 109 | 4.19 × 109 |
3-CP | 2.16 × 109 | 5.01 × 109 |
4-CP | 3.37 × 109 | 6.84 × 109 |
Frontier orbital theory is usually used to explain the mechanisms of radical reactions.28,29 In this study, quantum chemical calculations based on DFT were introduced to explain the differences in HP degradation between the UV/PDS and UV/H2O2 processes. According to the DFT calculations (Table 2), the HOMO energies of 2-BP, 3-BP, 4-BP, 2-CP, 3-CP, and 4-CP were determined to be −6.617243, −6.662641, −6.433939, −6.726734, −6.748275, and −6.577766 eV, respectively. The absolute values of the HOMO were in the order of 4-BP < 2-BP < 3-BP and 4-CP < 2-CP < 3-CP. Based on previous reports that a lower absolute value of the HOMO represents higher electrophilic reactivity,30 these results suggest that the electrophilic reactivities are in the order of 4-BP < 2-BP < 3-BP and 4-CP < 2-CP < 3-CP. This indicates that electrophilic reactions are most likely to occur at the para halogen atom of the HPs due to its highest charge density (i.e., lowest absolute value of the HOMO). It should be noted that the order of electrophilic reactivity was also consistent with that of the second order rate constants of SO4˙− with the BPs/CPs, confirming that the reactions of the BPs/CPs with SO4˙− mainly occur via electron transfer. However, in the case of HO˙, the order of the second order rate constants of the BPs/CPs with HO˙ were not all in agreement with that of the electrophilic reactivity of the BPs/CPs. This is because in addition to the electron transfer reaction, HO˙ is prone to oxidize via H-abstraction and addition reactions.21 In addition, it can be seen from Table 1 that the second-order reaction rate constants of the HPs and HO˙ were greater than those of the HPs with SO4˙−. This is likely due to the faster H-abstraction reaction of HO˙ than of SO4˙−. It has been reported that the H-abstraction reaction of HO˙ is 1 to 2 orders of magnitude faster than that of SO4˙−.21
Compound | HOMO energy (eV) | LUMO energy (eV) |
---|---|---|
2-BP | −6.617243 | −0.722943 |
3-BP | −6.662641 | −0.750628 |
4-BP | −6.433939 | −0.839727 |
2-CP | −6.726734 | −0.758318 |
3-CP | −6.748275 | −0.788026 |
4-CP | −6.577766 | −0.843039 |
Fig. 2 Effects of pH on the degradation of 2-BP in UV/PDS and UV/H2O2 processes. Experimental conditions: [2-BP] = 10 μM; 10 mM phosphate buffer; [PDS] = [H2O2] = 0.5 mM. |
This is because as the pH value of the solution increased (6.0 to 8.0), the deprotonation specie of 2-BP (pKa = 8.45) was enhanced, and the ionic 2-BP was more readily oxidized, resulting in the increase of kobs.18 In addition, as shown in Fig. 2, the direct photolysis of 2-BP is weak under acidic and neutral conditions; meanwhile, it is significant under alkaline conditions because the dissociated phenolate is more electron-rich when formed at higher pH values. When the pH decreased from 6.0 to 4.0, the kobs of 2-BP increased gradually; this is mainly due to the increased yields of the two free radicals with increasing acidity of the solution.31
In addition, phosphate buffer was employed to control the pH in these experiments; the concentration of HPO42− in the buffer increased gradually while the concentration of H2PO4− decreased with increasing pH, and the ability of HPO42− to capture free radicals was higher than that of H2PO4− (i.e., k′′ of HPO42− with SO4˙− and HO˙, H2PO4− with SO4˙− and HO˙: 1.2 × 106 M−1 s−1, 1.5 × 105 M−1 s−1, 7.2 × 104 M−1 s−1 and 2.0 × 104 M−1 s−1, respectively (eqn (4) to (7))).27 Therefore, the change of the pH value may change some ion concentrations (e.g., HPO42− and HPO4−) and influence the steady-state concentrations of free radicals, which further impacts the degradation of HPs in the UV/PDS and UV/H2O2 processes.
SO4˙− + H2PO4− → products, k = 7.2 × 104 M−1 s−1 | (4) |
SO4˙− + HPO42− → SO42− + HPO4−, k = 1.2 × 106 M−1 s−1 | (5) |
HO˙ + H2PO4− → H2O + HPO4˙−, k = 2.0 × 104 M−1 s−1 | (6) |
HO˙ + HPO42− → OH− + HPO4˙−, k = 1.5 × 105 M−1 s−1 | (7) |
As shown in Fig. 3, the degradation of 2-BP was inhibited when Cl− increased from 1 mM to 100 mM in UV/PDS; however, when the concentration of Cl− increased to 500 mM, the degradation rate of 2-BP was slightly enhanced. However, in the UV/H2O2 process, the presence of Cl− always had a slight inhibitory effect on the degradation of 2-BP, and the inhibition degree almost did not vary with changing Cl− concentration.
Fig. 3 Effects of Cl− on the degradation of 2-BP in UV/PDS and UV/H2O2 processes. Experimental conditions: [2-BP] = 10 μM; 10 mM phosphate buffer (pH 7.0); [PDS] = [H2O2] = 0.5 mM. |
With changing Cl− concentration, the direct photodegradation of 2-BP was almost unchanged; therefore, the variation of kobs was mainly due to the effects of Cl− on the oxidation of 2-BP by free radicals. When the concentration of Cl− is low (≤10 mM), Cl− will be converted by sulfate radical into Cl˙ with weak capability of oxidizing 2-BP,34 thus inhibiting the degradation of 2-BP (eqn (8)).35,36 With further increase of the Cl− concentration (≥100 mM), the Cl− in the reaction system can be converted into HOCl with stronger oxidation through a series of reactions (eqn (9) to (12));37 therefore, the degradation of 2-BP is enhanced.38 In addition, compared with the UV/PDS process, the inhibition effects of Cl− on the degradation of 2-BP are weak in the UV/H2O2 process. Because the reaction between Cl˙ and HO˙ is reversible, the addition of Cl− has no significant effect on the concentration of HO˙.
Cl− + SO4˙− → SO4− + Cl˙, k = 3.0 × 108 M−1 s−1 | (8) |
Cl− + Cl˙ → Cl2˙−, k = 8.5 × 109 M−1 s−1 | (9) |
Cl2˙− + Cl2˙− → Cl2 + 2Cl−, k = 9.0 × 108 M−1 s−1 | (10) |
Cl2˙− + Cl˙ → Cl2 + Cl−, k = 2.1 × 109 M−1 s−1 | (11) |
Cl2 + H2O → Cl− + HOCl + H+, k = 15 M−1 s−1 | (12) |
Fig. 4 Effects of HCO3− on the degradation of 2-BP in UV/PDS and UV/H2O2 processes. Experimental conditions: [2-BP] = 10 μM; 10 mM phosphate buffer (pH 7.0); [PDS] = [H2O2] = 0.5 mM. |
It can be seen that the presence of HCO3− can effectively inhibit the degradation of 2-BP in both processes. This is because HCO3− can react with SO4˙− and HO˙ (eqn (13) and (14)) with high reaction rate constants (106 M−1 s−1), and these reactions decrease the steady-state concentrations of SO4˙− and HO˙. In this process, although CO3˙− was produced, the generated CO3˙− reacted with the BPs with low reactivity.18
HCO3− + SO4˙− → HSO4− + CO3˙−, k = 9.1 × 106 M−1 s−1 | (13) |
HCO3− + HO˙ → H2O + CO3˙−, k = 8.5 × 106 M−1 s−1 | (14) |
In addition, HCO3− suppressed the degradation of pollutants in the UV/PDS system more significantly. This is because the scavenging effect of HCO3− on SO4˙− was stronger than that of HO˙. By calculating the competitive kinetics, the ratio of kOH˙,HCO3−/kOH˙,BP was found to be about 1.53 times higher than that of kOH˙,HCO3−/kSO4˙−,BP;40,41 this indicates that HCO3− has a stronger scavenging effect on SO4˙−.
Fig. 5 Effects of NOM on the degradation of 2-BP in UV/PDS and UV/H2O2 processes. Experimental conditions: [2-BP] = 10 μM; 10 mM phosphate buffer (pH 7.0); [PDS] = [H2O2] = 0.5 mM. |
The existence of NOM can significantly inhibit the degradation of 2-BP in both processes. On the one hand, the inhibitory effect of NOM was attributed to light shielding because of the high molar absorption coefficient of NOM.42 This light shielding effect of NOM reduced the photons absorbed by PDS and H2O2, resulting in decreases of the SO4˙− and HO˙ concentrations. On the other hand, it was previously reported that NOM can scavenge free radicals, leading to decreased SO4˙− and HO˙ concentrations. The reaction rate constants of NOM with SO4˙− and HO˙ were reported to be as high as 6.8 × 103 mgC L−1 s−1 and 1.4 × 104 mgC L−1 s−1, respectively.31,43
DFT was introduced to further analyze the transition state of 2-BP via calculating the HOMO orbital composition (Fig. S2†). According to the detected products and quantum chemical calculations, the reaction pathways were proposed (Fig. 6). C2, C5 and C4 in 2-BP were found to account for high percentages of the HOMO orbital composition, with 22.01%, 19.20% and 12.69%, respectively; this indicates that C2, C5 and C4 in 2-BP are most likely to be formed via electrophilic reactions. Thus, as the first step, SO4˙− is most likely to attack C2 on the benzene ring and then produce the corresponding intermediates R1, R2 and R3. The products of I, II and III were produced from the coupling of R1, R2 and R3.4 Then, these products (I, II and III) further reacted with SO4˙−, generating products IV and V; these may produce VII via a series of reaction processes, including ring-cleavage.
In comparison, the first step of the reaction of HO˙ with 2-BP is different from that of the reaction of SO4˙− with 2-BP based on the identified products. Bromohydroquinone (([M − H]−1) 186.96) was the product derived from hydroxyl addition of 2-BP, and R1 was further produced via elimination of one water molecule. In addition, catechol (([M − H]−1) 109.03) was the product of the hydroxyl addition of R3. The products I, II and III were also produced from the interactions of R1, R2 and R3. ([M − H]−1) 354.86 is the product formed from the reaction of HO˙ with product I. The first steps of the product pathways further suggest that SO4˙− is a strong one-electron oxidant that reacts with organic contaminants via electron transfer more readily than HO˙.
Furthermore, variation of the TOC during degradation was monitored. The results showed that in the UV/PDS system, the mineralization rate of the pollutant was 33%, while the TOC value decreased slightly in the UV/H2O2 system (as shown in Fig. S3†); this indicates that more complete degradation occurred in the UV/PDS system. This can be attributed to the fact that more radicals can be formed in the UV/PDS process based on the higher molar extinction coefficient of PDS (i.e., 21.1 M−1 cm−1) than of H2O2 (i.e., 18 M−1 cm−1) and the higher quantum yield of SO4˙− (i.e., 0.7 mol per einstein) during UV photolysis of PDS than of HO˙ (i.e., 0.5 mol per einstein) during H2O2 photolysis.34 It should be noted that the generation of toxic byproducts (such as hydroxylated polybrominated diphenyl ethers (OH-PBDEs) and hydroxylated polybrominated biphenyls (OH-PBBs)) in degradation processes should be of concern, given that high toxicity of these byproducts was reported in previous research.18,34,44 Literature reports about the degradation of HPs showed that increasing the dosage of oxidant can not only effectively remove pollutants, but can also achieve better dehalogenation efficiencies.3,34 It can also be inferred from the degradation of TOC that toxic byproducts can be gradually mineralized with increasing reaction time.
The presence of Cl−, HCO3− and NOM could inhibit the degradation of 2-BP due to their ability of scavenging free radicals. The DFT calculations indicated that SO4˙− reacts with HPs via electron transfer more readily than HO˙. The products further confirmed that SO4˙− is a strong one-electron oxidant that reacts with HPs mainly via electron transfer, while in the case of HO˙, it reacts with HPs via electron transfer and hydroxyl addition.
Footnote |
† Electronic supplementary information (ESI) available. See DOI: 10.1039/c9ra10401a |
This journal is © The Royal Society of Chemistry 2020 |