Takumi
Takeuchi
a,
Ryosuke
Shishido
a,
Koji
Kubota
*ab and
Hajime
Ito
*ab
aDivision of Applied Chemistry and Frontier Chemistry Center, Faculty of Engineering, Hokkaido University, Sapporo, Hokkaido, Japan. E-mail: kbt@eng.hokudai.ac.jp; hajito@eng.hokudai.ac.jp
bInstitute for Chemical Reaction Design and Discovery (WPI-ICReDD), Hokkaido University, Sapporo, Hokkaido, Japan
First published on 3rd August 2021
The synthesis of a series of hydrosilylboronates via the selective iridium- or nickel-catalyzed monoborylation of dihydrosilane Si–H bonds is described. The synthesized silylboronates, which bear a single Si–H bond, can be used as novel silicon nucleophiles in the presence of transition-metal catalysts or bases. The first 29Si{1H} NMR spectroscopic evidence for the formation of (t-Bu)2HSiLi, generated by the reaction of (t-Bu)2HSi–B(pin) with MeLi, is reported as the first example of a dialkylhydorosilyl lithium species.
The typical synthetic route to silylboronates involves a stoichiometric reaction between a silyl anion and a boron electrophile.2 As silyl anions are in most cases produced by the reduction of chlorosilanes with alkali metals, the variety of substituents tolerated on the silicon atom is quite limited; moreover, at least one aromatic group is required at the silicon center in order to reduce chlorosilanes and disilane intermediates.4,5 Additionally, due to the harsh reduction conditions, this method suffers from low functional-group compatibility. Therefore, only a limited range of silylboronates can be prepared using this approach.
Instead, the direct borylation of Si–H bonds has emerged as a valuable complementary method for the synthesis of silylboronates (Scheme 1a).6,7 In 2008, Hartwig and co-workers reported a ground-breaking study on the borylation of trialkylhydrosilanes with bis(pinacolato)diboron [B2(pin)2] in the presence of an iridium-based catalyst. This reaction forms trialkylsilylboronates, which cannot be synthesized using the conventional reduction based on alkali metals.6 In 2020, our group reported that rhodium- and platinum-based catalysts can promote the borylation of trialkylhydrosilanes with B2(pin)2. Our method enables the synthesis of bulky and functionalized trialkylsilylboronates that are difficult to access via either the iridium-catalyzed borylation or the conventional reduction method (Scheme 1a).7
In the present study, we discovered that the monoborylation of a dihydrosilane Si–H bond can be achieved in the presence of iridium- or nickel-based catalysts, yielding hydrosilylboronates that bear a hydrogen atom at the silicon center (Scheme 1b). In 2004, Tokitoh and co-workers reported the first synthesis of diarylhydrosilylboronates via the insertion of a silylene into a H–B bond.8 Although this pioneering study is remarkable, the substituents on the silicon atom are limited to extremely bulky aryl moieties, such as mesityl and 2,4,6-tris[bis(trimethylsilyl)methyl]phenyl groups, due to the highly reactive silylene species involved in the reaction.8 The monoborylation approach reported here is applicable to the synthesis of dialkylhydrosilylboronates and alkylarylhydrosilylboronates from easily accessible dihydrosilanes. These hydrosilylboronates are difficult to access by any other means. Furthermore, we demonstrate that these hydrosilylboronates can be used as novel silicon nucleophiles in the presence of a transition-metal catalyst or base. Moreover, we report the first 29Si{1H} NMR spectroscopic evidence for the formation of (t-Bu)2HSiLi, generated via the reaction of (t-Bu)2HSi–B(pin) with MeLi. Although the synthesis of disilylhydrosilyl lithium compounds has already been reported by Iwamoto, Kira and co-workers,5f this is the first example of the formation of dialkylhydrosily lithium species.
Entry | Catalyst (mol%) | Ligand (mol%) | Base (mol%) | Yield (%) of 3ab |
---|---|---|---|---|
a Conditions: 1a (0.50 mmol), 2 (1.0 mmol), catalyst, ligand, and base in cyclohexane (1.0 mL) at 80 °C. b Determined by GC analysis of the reaction mixture using n-C13H28 as the internal standard. The isolated yield is shown in parentheses. c N,N-Dimethylformamide (DMF) was used as the solvent. d The reaction was carried out at the 1.0 mmol scale. e Average of four runs. f n-Octane was used as the solvent and the reaction was carried out at 120 °C. | ||||
1 | [Ir(cod)Cl]2 (2.5) | L1 (5) | None | 68 |
2c | [Rh(cod)Cl]2 (2.5) | L2 (10) | K(O-t-Bu) (20) | <1 |
3 | Pt/C (5 wt%) (5) | None | None | 36 |
4 | [Ir(cod)Cl]2 (2.5) | L2 (10) | K(O-t-Bu) (15) | 43 |
5 | [Ir(cod)Cl]2 (2.5) | L3 (5) | K(O-t-Bu) (10) | 73 |
6d | [Ir(cod)Cl]2 (0.5) | L3 (1) | K(O-t-Bu) (2) | 71 (63) |
7 | Ni(cod)2 (5) | L4 (10) | K(O-t-Bu) (10) | <1 |
8 | Ni(cod)2 (5) | L2 (10) | K(O-t-Bu) (10) | 50e |
9f | Ni(cod)2 (5) | L2 (10) | K(O-t-Bu) (10) | 54e |
To highlight the practical utility of this borylation protocol, a gram-scale synthesis of 3a was carried out (Scheme 2). In the presence of the newly developed iridium-based catalyst, 3a was obtained in 70% yield (1.33 g) even when a lower catalyst loading was employed (0.5 mol%).
The molecular structure of 3a was confirmed by single-crystal X-ray diffraction analysis (for details, see the ESI†). Although several conformers of 3a were observed in the disordered structure, the presence of a silicon–boron bond was confirmed unambiguously.
With the optimized conditions in hand, the synthesis of various dialkylhydrosilylboronates was investigated (Scheme 3). The dialkylhydrosilylboronate that bears two cyclohexyl groups (3b) was produced via both of the iridium- and nickel-catalyzed borylation reactions of the corresponding dihydrosilane (1b) (24% and 38% GC yields, respectively). In the case of nickel-catalyzed borylation, 3b was isolated by silica-gel column chromatography without significant decomposition (29% isolated yield). Next, the monoborylation of a dihydrosilane bearing a tertiary and a primary alkyl group (1c) was investigated. The desired dialkylhydrosilylboronate (3c) was obtained in low yield using the iridium-based catalyst (11% isolated yield, Scheme 3b). The nickel-based catalyst was more effective for the borylation of 1c, generating 3c in 43% isolated yield (Scheme 3b). We found that the sterically less hindered dialkyldihydrosilane 1d did not provide 3d under either set of conditions (Scheme 3c). We speculated that less hindered dihydrosilanes could potentially undergo fast dehydrogenative coupling with another dihydrosilane molecule, facilitated by the metal catalyst, to form silicon-based oligomers,11 thus impeding the desired borylation reaction.
Scheme 3 Si–H monoborylation of dihydrosilanes 1b–1d. Isolated yields are shown. GC yields are shown in parentheses. |
Furthermore, aryl-substituted dihydrosilanes were employed for the present monoborylation reaction (Table 2). Pleasingly, t-BuPhHSi–B(pin) (3e) was obtained from both the iridium- and nickel-based catalytic systems in 57% and 31% yield, respectively (entry 1). Unfortunately, sterically less hindered CyPhSiH2 (1f) and n-BuPhSiH2 (1g) did not produce the corresponding hydrosilylboronates (3f and 3g; entries 2 and 3). In these cases, the formation of oligosilanes produced by dehydrogenative homo-coupling was observed,11 suggesting that the presence of a bulky t-Bu group on the silicon atom is necessary for efficient Si–H monoborylation. Next, the steric effect of the aryl group was investigated (entries 4–6). para-Tolyl- and meta-tolyl-substituted hydrosilylboronates 3h and 3i were obtained in yields comparable to that of 3e (entries 4 and 5). However, ortho-tolyl-substituted hydrosilylboronate 3j was not obtained by the Si–H monoborylation using the iridium-based catalyst; this is probably due to a competing benzylic C–H borylation (entry 6).12 In contrast, the nickel-based catalyst afforded 3j in good yield (59% isolated yield; entry 6). Hydrosilylboronate 3k, which bears a 4-MeOC6H4 group, was also obtained in a yield comparable to that of 3e (entry 7). Notably, these hydrosilylboronates (3e and 3h–3k) show high stability toward air and moisture and can be isolated by flash column chromatography on silica gel. Although the monoborylation of diarylsilanes was also attempted, the desired silylboronates were not obtained (for details, see the ESI†).
Entry | Silane (1) | Product (3) | Isolated yield (%) |
---|---|---|---|
a [Ir] conditions: 1e–i (0.50 mmol), 2 (1.0 mmol), [Ir(cod)Cl]2 (0.50 mol%), and L1 (1.0 mol%) in cyclohexane (1.0 mL) at 80 °C for 24 h. [Ni] conditions: 1e–i (0.50 mmol), 2 (1.0 mmol), Ni(cod)2 (5.0 mol%), L2 (10 mol%), and K(O-t-Bu) (10 mol%) in n-octane (1.0 mL) at 120 °C for 24 h. | |||
1 | [Ir]: 57% | ||
[Ni]: 31% | |||
2 | [Ir]: <1% | ||
[Ni]: <1% | |||
3 | [Ir]: <1% | ||
[Ni]: <1% | |||
4 | [Ir]: 61% | ||
[Ni]: 29% | |||
5 | [Ir]: 58% | ||
[Ni]: 31% | |||
6 | [Ir]: <1% | ||
[Ni]: 59% | |||
7 | [Ir]: 71% | ||
[Ni]: 29% |
To demonstrate the synthetic utility of the newly synthesized hydrosilylboronates, a preliminary study of the activity of 3a in nucleophilic silylation reactions was conducted (Scheme 4). A copper(I)-catalyzed conjugated silylation of cyclohexenone (4) with 3a proceeded to form the desired β-silylated ketone (5) in 56% yield (Scheme 4).13 Furthermore, a nickel-catalyzed silylation of 2-methoxynaphthalene 6 with 3a produced the corresponding aryl silane (7) in 36% yield (Scheme 4).14 In addition to nucleophilic silylations, 3a could also be applied to a Si–H bond-functionalization reaction. For example, the chlorination of a Si–H bond in 3a, when treated with trichloroisocyanuric acid (8), furnished chlorosilylborane 9 in 76% yield (Scheme 4).15
Oligosilanes are currently of interest due to their unique optical, electronic, and photoreactive properties, which originate from their silicon–silicon bonds.16 Thus, we carried out silicon–silicon cross-coupling reactions between newly synthesized silylboronate 3a and various silyl chlorides, in the presence of an activating nucleophile (Scheme 5).7,17 The silicon–silicon coupling between 3a and triethylsilyl chloride in the presence of methyl lithium (MeLi) afforded the corresponding Si–H bond-bearing disilane (10a) in excellent yield (92%, Scheme 5a). Furthermore, the nucleophilic disilylation of both dichlorodiethylsilane and 1,2-dichlorotetramethyldisilane proceeded smoothly to form the desired trisilane (10b) and tetrasilane (10c) in 85% and 76% yield, respectively (Scheme 5b and c). The silicon–silicon coupling products can be used as building blocks for the construction of novel silicon-based compounds via further derivatizations based on Si–H bond functionalizations.
Finally, we conducted in situ29Si{1H} NMR experiments to confirm the formation of a dialkylhydrosilyl anion in the reaction of 3a with MeLi. Kawachi and Tamao have reported the formation of Ph3SiLi during the reaction of Ph3Si–B(pin) with MeLi.17 More recently, we have reported the formation of i-Pr3SiLi during the reaction of i-Pr3Si–B(pin) with MeLi.7 Although Iwamoto, Kira and co-workers have already reported the generation of disilylhydrosilyllithium compounds in the reaction between disilyldihydrosilanes and alkyllithiums,5f to the best of our knowledge, the generation of a dialkylhydrosilyllithium species has not been reported so far.5f In the present study, we attempted to produce the dialkylhydrosilyl anion of 3avia treatment with MeLi in THF-d8 (Fig. 1). We observed a new 29Si signal (σ 14.2 ppm), which was attributed to silyllithium 11, in the 29Si{1H} NMR spectrum at room temperature (Fig. 1a). Furthermore, the 29Si–7Li coupling of 11 was observed at −95 °C (σ 11.8 ppm, quartet, J [29Si–7Li] = 50 Hz) (Fig. 1b). These results indicate that (t-Bu)2HSiLi (11) is generated in situ. This is in agreement with the reports from Kawachi and our group on the heterolytic cleavage and the formation of silyl anion species Ph3SiLi and i-Pr3SiLi.7,17 To the best of our knowledge, this is the first 29Si{1H} NMR spectroscopic evidence for the formation of a dialkylhydrosilyllithium species.
Footnote |
† Electronic supplementary information (ESI) available. CCDC 2065033. For ESI and crystallographic data in CIF or other electronic format see DOI: 10.1039/d1sc01440d |
This journal is © The Royal Society of Chemistry 2021 |