Issue 18, 2021

Interface engineering with an AlOx dielectric layer enabling an ultrastable Ta3N5 photoanode for photoelectrochemical water oxidation

Abstract

Photoelectrochemical water splitting is a promising approach for solar energy to chemical energy conversion. However, the development of highly stable and efficient photoanodes still remains a great challenge. Here we demonstrate an ultrastable Ta3N5 photoanode modified with an AlOx dielectric layer and a hole storage layer (ferrihydrite, Fh). It is found that the AlOx layer not only reduces the formation of interfacial trap states of Ta3N5, but also promotes the separation of photogenerated charges. This bilayer synergistically promotes the extraction and transfer of photogenerated holes from Ta3N5 to the NiFeOx cocatalyst. As a result, the Ta3N5 based photoanode exhibits significant inhibition of photocorrosion, and achieves an ultrastable photocurrent generation of 11.8 mA cm−2 at 1.23 V vs. the reversible hydrogen electrode (RHE) over 120 hours. This work reveals the crucial role of the AlOx dielectric layer in rational interface engineering of photoelectrodes.

Graphical abstract: Interface engineering with an AlOx dielectric layer enabling an ultrastable Ta3N5 photoanode for photoelectrochemical water oxidation

Supplementary files

Article information

Article type
Paper
Submitted
08 Jan 2021
Accepted
13 Mar 2021
First published
14 Apr 2021

J. Mater. Chem. A, 2021,9, 11285-11290

Interface engineering with an AlOx dielectric layer enabling an ultrastable Ta3N5 photoanode for photoelectrochemical water oxidation

Y. Zhao, G. Liu, H. Wang, Y. Gao, T. Yao, W. Shi and C. Li, J. Mater. Chem. A, 2021, 9, 11285 DOI: 10.1039/D1TA00206F

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements