Enhanced synaptic characteristics of electrolyte-gated oxide transistors enabled by optimizing interface states at the oxide semiconductor/electrolyte interface

Abstract

Advanced bionic neuromorphic systems hold great promise for e-skin applications due to their efficient parallel processing and sensory capabilities. Metal oxide semiconductor-based electrolyte-gated transistors (MOS-EGTs) offer a low-power platform for artificial neural networks. However, the impact of channel/electrolyte interface traps on synaptic plasticity remains unclear due to the complexity and lack of direct observation methods. In this study, we developed a simplified model to uncover the intrinsic correlation between surface states of oxide semiconductors and the synaptic plasticity of electrolyte-gated transistors (EGTs) by selectively modulating the surface defect state density of the oxide semiconductors. The ITZO EGT with low-density interface traps exhibited enhanced synaptic characteristics, including excitatory post-synaptic current (EPSC), paired-pulse facilitation (PPF), and long-term memory (LTM). Furthermore, neural network simulations using this device achieved a high recognition accuracy of ∼90%. This study deepens the understanding of interface trap effects and provides a feasible approach for constructing high-efficiency, low-power MOS-based artificial neural networks.

Graphical abstract: Enhanced synaptic characteristics of electrolyte-gated oxide transistors enabled by optimizing interface states at the oxide semiconductor/electrolyte interface

Supplementary files

Transparent peer review

To support increased transparency, we offer authors the option to publish the peer review history alongside their article.

View this article’s peer review history

Article information

Article type
Paper
Submitted
28 Feb 2025
Accepted
30 Apr 2025
First published
02 May 2025

J. Mater. Chem. C, 2025, Advance Article

Enhanced synaptic characteristics of electrolyte-gated oxide transistors enabled by optimizing interface states at the oxide semiconductor/electrolyte interface

Y. Li, Y. Chen, L. Zhang, S. Ju, R. Wang, X. Fu, C. Fan, X. Liu, K. Lu, T. Qiu, H. Ning, A. Huang and J. Luo, J. Mater. Chem. C, 2025, Advance Article , DOI: 10.1039/D5TC00895F

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements