Issue 16, 2003
From the journal:

Chemical Communications

New bonding modes of gas-phase deposited γ-aminopropyltriethoxysilane on silica studied by 29Si CP/MAS NMR

Satu Ek,a   Eero I. Iiskola,*a   Lauri Niinistö,a   Tuula T. Pakkanenb  and  Andrew Rootc  

* Corresponding authors

a Laboratory of Inorganic and Analytical Chemistry, Helsinki University of Technology, P.O.Box 6100, FIN-02015 Espoo, Finland
E-mail: Eero.Iiskola@hut.fi
Fax: 358-9-462 373
Tel: 358-9-4511

b Department of Chemistry, University of Joensuu, P.O.Box 111, FIN-80101 Joensuu, Finland

c Fortum Oil & Gas Oy, Technology Centre, P.O.Box 310, FIN-06101 Porvoo, Finland

Abstract

Besides the well-known reaction between the ethoxy groups of the silane end of the γ-aminopropyltriethoxysilane (APTS) molecule and the silanols of silica, the amino ends of APTS molecules were observed to react in the gas phase with ethoxy groups of other APTS molecules and silanols of silica at elevated temperatures on the silica surface, dehydroxylated at 600 °C, forming Si–N linkages, as established by 29Si CP/MAS NMR.

Graphical abstract: New bonding modes of gas-phase deposited γ-aminopropyltriethoxysilane on silica studied by 29Si CP/MAS NMR

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Article information

DOI
https://doi.org/10.1039/B305534E
Article type
Communication
Submitted
16 May 2003
Accepted
24 Jun 2003
First published
03 Jul 2003

Chem. Commun., 2003, 2032-2033

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New bonding modes of gas-phase deposited γ-aminopropyltriethoxysilane on silica studied by 29Si CP/MAS NMR

S. Ek, E. I. Iiskola, L. Niinistö, T. T. Pakkanen and A. Root, Chem. Commun., 2003, 2032 DOI: 10.1039/B305534E

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