Issue 32, 2005

Colloidal lithography with crosslinkable particles: fabrication of hierarchical nanopore arrays

Abstract

We demonstrate that colloidal lithography with self-assembled monolayers of crosslinkable polymeric particles can be used to create hierarchical arrays of nanopores on substrates.

Graphical abstract: Colloidal lithography with crosslinkable particles: fabrication of hierarchical nanopore arrays

Article information

Article type
Communication
Submitted
27 May 2005
Accepted
24 Jun 2005
First published
14 Jul 2005

Chem. Commun., 2005, 4107-4109

Colloidal lithography with crosslinkable particles: fabrication of hierarchical nanopore arrays

J. H. Moon, W. S. Kim, J. Ha, S. G. Jang, S. Yang and J. Park, Chem. Commun., 2005, 4107 DOI: 10.1039/B507542D

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements