Issue 33, 2005
From the journal:

Journal of Materials Chemistry

Deposition of LaAlO3 films by liquid injection MOCVD using a new [La–Al] single source alkoxide precursor

Troy D. Manning,a   Yim Fun Loo,a   Anthony C. Jones,*ac   Helen C. Aspinall,*a   Paul R. Chalker,b   Jamie F. Bickley,a   Lesley M. Smithc  and  Gary W. Critchlowd  

* Corresponding authors

a Department of Chemistry, University of Liverpool, Liverpool, UK
E-mail: tjconsultancy@btconnect.com, hca@liv.ac.uk

b Department of Materials Science Engineering, University of Liverpool, Liverpool, UK

c Epichem Limited, Power Road, Bromborough, Wirral, Merseyside, UK
E-mail: tjconsultancy@btconnect.com

d Institute of Surface Science Technology, University of Loughborough, Loughborough, Leicestershire, UK

Abstract

The new bimetallic alkoxide complex [LaAl(OPri)6(PriOH)]2 has been synthesised from the reaction between LaCl3, KAl(OPri)4 and KOPri in PriOH/toluene. The complex is volatile and has been used as a “single-source” precursor for the deposition of LaAlO3 by liquid injection MOCVD. The crystal structure of [LaAl(OPri)6(PriOH)]2 has also been determined.

Graphical abstract: Deposition of LaAlO3 films by liquid injection MOCVD using a new [La–Al] single source alkoxide precursor

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Article information

DOI
https://doi.org/10.1039/B507004J
Article type
Communication
Submitted
17 May 2005
Accepted
20 Jul 2005
First published
01 Aug 2005

J. Mater. Chem., 2005,15, 3384-3387

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Deposition of LaAlO3 films by liquid injection MOCVD using a new [La–Al] single source alkoxide precursor

T. D. Manning, Y. F. Loo, A. C. Jones, H. C. Aspinall, P. R. Chalker, J. F. Bickley, L. M. Smith and G. W. Critchlow, J. Mater. Chem., 2005, 15, 3384 DOI: 10.1039/B507004J

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