Issue 6, 2006
From the journal:

Chemical Communications

The preparation of a phosphorus doped silicon film from phosphorus containing silicon nanoparticles†

Richard K. Baldwin,a   Jing Zou,a   Katherine A. Pettigrew,a   Gregory J. Yeagle,a   R. David Britta  and  Susan M. Kauzlarich*a  

* Corresponding authors

a Department of Chemistry, University of California, One Shields Avenue, Davis, CA 95616, USA
E-mail: smkauzlarich@ucdavis.edu
Fax: +1 530 752-8995
Tel: +1 530 752-4756

Abstract

Phosphorus containing and octyl-terminated silicon nanoparticles (NPs) are generated by a solution reduction route under room temperature conditions for the first time and characterized by TEM, HRTEM, EDX, 1H/13C/31P NMR, EPR, and PL spectroscopy, then annealed to form a thin film with phosphorus doping confirmed by microprobe elemental analyses.

Graphical abstract: The preparation of a phosphorus doped silicon film from phosphorus containing silicon nanoparticles

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Article information

DOI
https://doi.org/10.1039/B513330K
Article type
Communication
Submitted
21 Sep 2005
Accepted
13 Dec 2005
First published
13 Jan 2006

Chem. Commun., 2006, 658-660

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The preparation of a phosphorus doped silicon film from phosphorus containing silicon nanoparticles

R. K. Baldwin, J. Zou, K. A. Pettigrew, G. J. Yeagle, R. D. Britt and S. M. Kauzlarich, Chem. Commun., 2006, 658 DOI: 10.1039/B513330K

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