Issue 12, 2011
From the journal:

Chemical Communications

An inorganic–organic diblock copolymer photoresist for direct mesoporous SiCN ceramic patterns viaphotolithography†

Chi Thanh Nguyen,a   Phan Huy Hoang,a   Jayakumar Perumala  and  Dong-Pyo Kim*ab  

* Corresponding authors

a National Creative Research Center of Applied Microfluidic Chemistry, Chungnam National University, 220 Kung Dong, Yuseong Gu, Daejeon 305-764, Korea

b Graduate School of Analytical Science and Technology, Chungnam National University, 220 Kung Dong, Yuseong Gu, Daejeon 305-764, Korea
E-mail: dpkim@cnu.ac.kr
Web: www.camc.re.kr
Fax: +82 42 823 6665
Tel: +82 42 821 6695

Abstract

A high resolution negative-tone-type of inorganic–organic diblock copolymer photoresist was synthesized as a novel precursor for simple and direct fabrication of SiCN ceramic mesoporous patterns with ordered nanoscale pores by using a “top-down” photolithographic technique and the subsequent sacrificial processes of a “bottom-up” self-assembled nanostructure.

Graphical abstract: An inorganic–organic diblock copolymer photoresist for direct mesoporous SiCN ceramic patterns viaphotolithography

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Article information

DOI
https://doi.org/10.1039/C0CC05836J
Article type
Communication
Submitted
29 Dec 2010
Accepted
25 Jan 2011
First published
11 Feb 2011

Chem. Commun., 2011,47, 3484-3486

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An inorganic–organic diblock copolymer photoresist for direct mesoporous SiCN ceramic patterns viaphotolithography

C. T. Nguyen, P. H. Hoang, J. Perumal and D. Kim, Chem. Commun., 2011, 47, 3484 DOI: 10.1039/C0CC05836J

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