Molecular imprinting for removing highly toxic organic pollutants
Abstract
Molecular imprinting technology allows synthesis of
* Corresponding authors
a
Key Laboratory of Catalysis and Materials Science of the State Ethnic Affairs Commission and Ministry of Education, College of Chemistry and Materials Science, South-Central University for Nationalities, Wuhan 430074, P.R. China
E-mail:
lhzhu63@yahoo.com.cn, hqtang62@yahoo.com.cn
Fax: +86-27-87543632
Tel: +86-27-87543432
b College of Chemistry and Chemical Engineering, Huazhong University of Science and Technology, Wuhan 430074, P.R. China
c Division of Pure and Applied Biochemistry, Lund University, Box 124, 221 00 Lund, Sweden
Molecular imprinting technology allows synthesis of
X. Shen, L. Zhu, N. Wang, L. Ye and H. Tang, Chem. Commun., 2012, 48, 788 DOI: 10.1039/C2CC14654A
To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.
If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.
If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.
Read more about how to correctly acknowledge RSC content.
Fetching data from CrossRef.
This may take some time to load.
Loading related content