Conducting polymernanowires fabricated by edge effect of NIL
Abstract
We present an unconventional nanoimprinting lithography (
* Corresponding authors
a
State Key Laboratory of Supramolecular Structure and Materials, College of Chemistry, Jilin University, Changchun, P. R. China
E-mail:
luenan@jlu.edu.cn
b
Physikalisches Institut and Center for Nanotechnology (C198eNTech), Westfälische Wilhelms-Universität Münster, D-48149 Münster, Germany
E-mail:
chi@uni-muenster.de
We present an unconventional nanoimprinting lithography (
G. Shi, L. Li, L. Liu, D. Xu, N. Lu, J. Hao, C. Huang and L. Chi, J. Mater. Chem., 2012, 22, 12096 DOI: 10.1039/C2JM31006F
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