The restoration of DNA structures by the dry–wet method†
Abstract
Since DNA nanotechnology often requires water-based solution
* Corresponding authors
a
Sungkyunkwan Advanced Institute of Nanotechnology (SAINT) and Department of Physics, Sungkyunkwan University, Suwon, Korea
E-mail:
sunghapark@skku.edu
b Korea Research Institute of Standards and Science, Daejeon, Korea
c School of Electrical and Electronic Engineering, Yonsei University, Seoul, Korea
d Research and Development Division, Hynix Semiconductor Inc., Icheon, Korea
Since DNA nanotechnology often requires water-based solution
J. Lee, R. Amin, B. Kim, S. J. Ahn, K. W. Lee, H. J. Kim and S. H. Park, Soft Matter, 2012, 8, 619 DOI: 10.1039/C1SM06555F
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