Issue 98, 2013
From the journal:

Chemical Communications

Synthesis of solvent stable polymeric membranes via UV depth-curing†

Izabela Strużyńska-Piron,a   Johan Loccufier,b   Luc Vanmaeleb  and  Ivo F. J. Vankelecom*a  

* Corresponding authors

a Centre for Surface Chemistry and Catalysis, KU Leuven, Kasteelpark Arenberg 23, PO Box 2461, 3001 Leuven, Belgium
E-mail: ivo.vankelecom@biw.kuleuven.be
Fax: +32 1632 1998
Tel: +32 1632 1594

b Agfa-Gevaert N.V., Septestraat 27, B-2640 Mortsel, Belgium

Abstract

Solvent stable polymeric membranes with morphologies ranging from highly porous to dense were prepared via UV curing using dedicatedly designed photopolymerizable compositions. To optimize the UV curing efficiency, various parameters including the photoinitiator type, cross-linker functionality, as well as membrane thickness were investigated. UV modified polysulfone membranes showed excellent solvent stability in addition to a 91% Rose Bengal (1017 Da) retention at a superior ethyl acetate permeance of 8 l m−2 h−1 bar−1 in a typical solvent resistant nanofiltration (SRNF) experiment.

Graphical abstract: Synthesis of solvent stable polymeric membranes via UV depth-curing

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Article information

DOI
https://doi.org/10.1039/C3CC46795C
Article type
Communication
Submitted
05 Sep 2013
Accepted
16 Oct 2013
First published
17 Oct 2013

Chem. Commun., 2013,49, 11494-11496

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Synthesis of solvent stable polymeric membranes via UV depth-curing

I. Strużyńska-Piron, J. Loccufier, L. Vanmaele and I. F. J. Vankelecom, Chem. Commun., 2013, 49, 11494 DOI: 10.1039/C3CC46795C

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