Issue 39, 2013
From the journal:

Journal of Materials Chemistry C

Atmospheric pressure chemical vapor deposition of high silica SiO2–TiO2 antireflective thin films for glass based solar panels†

Erik R. Klobukowski,a   Wyatt E. Tenhaeff,a   James W. McCamy,b   Caroline S. Harrisb  and  Chaitanya K. Narula*a  

* Corresponding authors

a Materials Science & Technology Division, Oak Ridge National Laboratory, P.O. Box 2008, Oak Ridge, TN 37831-6133, USA
E-mail: narulck@ornl.gov

b Solar Performance Group, PPG Industries, Cheswick, PA 15024-9464, USA

Abstract

The atmospheric pressure chemical vapor deposition (APCVD) of SiO2–TiO2 thin films on glass by employing a [[(tBuO)3SiO]2–Ti(OiPr)2] single-source precursor, which can be prepared from commercially available materials, results in antireflective thin films with high silica SiO2 : TiO2 ratio (i.e. SiO2 > 1) on float glass under industrially relevant manufacturing conditions.

Graphical abstract: Atmospheric pressure chemical vapor deposition of high silica SiO2–TiO2 antireflective thin films for glass based solar panels

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Article information

DOI
https://doi.org/10.1039/C3TC31465K
Article type
Communication
Submitted
26 Jul 2013
Accepted
29 Aug 2013
First published
30 Aug 2013

J. Mater. Chem. C, 2013,1, 6188-6190

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Atmospheric pressure chemical vapor deposition of high silica SiO2–TiO2 antireflective thin films for glass based solar panels

E. R. Klobukowski, W. E. Tenhaeff, J. W. McCamy, C. S. Harris and C. K. Narula, J. Mater. Chem. C, 2013, 1, 6188 DOI: 10.1039/C3TC31465K

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