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Much research has been devoted to improving the water splitting efficiency of hematite photoanodes. In this study, we demonstrate a significant advance in the colloidal nanocrystal deposition (CND) process to obtain hematite thin films with high photoelectrochemical performance. For this approach, we designed the magnetic field-assisted dip coating process to achieve homogeneous hematite thin films by using magnetic nanocrystals (maghemite) as the precursor. Using this non-aqueous deposition route, we produced undoped and Sn-doped hematite photoanodes with excellent photocurrents of 1.4 mA cm−2 at 1.23 VRHE and 2.7 mA cm−2 at 1.23 VRHE, respectively, using a standard AM1.5 G solar light simulator.

Graphical abstract: The colloidal nanocrystal deposition process: an advanced method to prepare high performance hematite photoanodes for water splitting

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