Issue 3, 2014

Copper-catalyzed trifluoromethylthiolation of aryl and vinyl boronic acids with a shelf-stable electrophilic trifluoromethylthiolating reagent

Abstract

A new high yielding method for the preparation of a shelf-stable electrophilic trifluoromethylthiolating reagent, N-(trifluoromethylthio)phthalimide, is described. Reaction of this reagent with a variety of aryl and vinyl boronic acids in the presence of a copper catalyst generated the trifluoromethylthiolated arenes and alkenes in good to excellent yields.

Graphical abstract: Copper-catalyzed trifluoromethylthiolation of aryl and vinyl boronic acids with a shelf-stable electrophilic trifluoromethylthiolating reagent

Supplementary files

Article information

Article type
Research Article
Submitted
14 Dec 2013
Accepted
01 Mar 2014
First published
03 Mar 2014

Org. Chem. Front., 2014,1, 294-297

Copper-catalyzed trifluoromethylthiolation of aryl and vinyl boronic acids with a shelf-stable electrophilic trifluoromethylthiolating reagent

K. Kang, C. Xu and Q. Shen, Org. Chem. Front., 2014, 1, 294 DOI: 10.1039/C3QO00068K

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