Facile chemical solution deposition of nanocrystalline CrN thin films with low magnetoresistance

Abstract

CrN thin films are first prepared by a facile chemical solution deposition method. The results show that the derived CrN thin films are nanocrystalline with the grain size of 30–60 nm. X-ray photoelectron spectroscopy measurement shows the stoichiometry of the derived thin film. The temperature dependent resistivity within the range of 2–300 K shows a semiconductor-like behavior with dρ/dT < 0 and a discontinuity in resistivity at 253 K is observed due to the antiferromagnetic transition. At 10 K the magnetoresistance is as low as −0.06% under 45 kOe. The first growth of CrN thin films by the facile chemical solution deposition will provide an alternative route to prepare CrN thin films, especially for large-area CrN thin films with low-cost.