We describe a method to pattern arbitrary-shaped silane self-assembled monolayers (SAMs) with nm scale resolution using DNA nanostructures as templates. The DNA nanostructures assembled on a silicon substrate act as a soft-mask to negatively pattern SAMs. Mixed SAMs can be prepared by back filling the negative tone patterns with a different silane.
S. P. Surwade, F. Zhou, Z. Li, A. Powell, C. O'Donnell and H. Liu, Chem. Commun., 2016, 52, 1677 DOI: 10.1039/C5CC08183A
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