Issue 40, 2016
From the journal:

Nanoscale

Solution-processed ultra-low-k thin films comprising single-walled aluminosilicate nanotubes†

An-Chih Yang,a   Yun-Shiuan Li,b   Chon Hei Lam,a   Heng-Yu Chi,a   I-Chun Cheng ORCID logo *b  and  Dun-Yen Kang*a  

* Corresponding authors

a Department of Chemical Engineering, National Taiwan University, No. 1, Sec. 4, Roosevelt Road, Taipei 10617, Taiwan
E-mail: dunyen@ntu.edu.tw

b Graduate Institute of Photonics and Optoelectronics, National Taiwan University, No. 1, Sec. 4, Roosevelt Road, Taipei 10617, Taiwan
E-mail: iccheng@ntu.edu.tw

Abstract

Nanotube-based ultra-low-k thin films with high Young's modulus composed of single-walled aluminosilicate nanotubes (AlSiNTs) and a trace amount of poly(vinyl alcohol) (PVA) have been developed. The dehydrated AlSiNT film possesses a relative permittivity of 1.05, and a Young's modulus of 25 GPa, which exceed those of most existing ultra-low-k materials.

Graphical abstract: Solution-processed ultra-low-k thin films comprising single-walled aluminosilicate nanotubes

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Article information

DOI
https://doi.org/10.1039/C6NR06106K
Article type
Communication
Submitted
02 Aug 2016
Accepted
13 Sep 2016
First published
30 Sep 2016

Nanoscale, 2016,8, 17427-17432

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Solution-processed ultra-low-k thin films comprising single-walled aluminosilicate nanotubes

A. Yang, Y. Li, C. H. Lam, H. Chi, I. Cheng and D. Kang, Nanoscale, 2016, 8, 17427 DOI: 10.1039/C6NR06106K

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