Issue 19, 2016

Self-assembly nanostructured gold for high aspect ratio silicon microstructures by metal assisted chemical etching

Abstract

Self-assembly gold nanostructured membranes are created to mechanically stabilize the catalyst movement during metal assisted chemical etching. This results in an improved vertical control of the etching profile for high aspect ratio silicon microstructures. The new method is a robust and cheap microfabrication for dense micro-patterns on a large area, such as diffraction gratings for hard X-ray phase contrast imaging and metrology.

Graphical abstract: Self-assembly nanostructured gold for high aspect ratio silicon microstructures by metal assisted chemical etching

Supplementary files

Article information

Article type
Communication
Submitted
24 Nov 2015
Accepted
24 Jan 2016
First published
08 Feb 2016

RSC Adv., 2016,6, 16025-16029

Author version available

Self-assembly nanostructured gold for high aspect ratio silicon microstructures by metal assisted chemical etching

L. Romano, M. Kagias, K. Jefimovs and M. Stampanoni, RSC Adv., 2016, 6, 16025 DOI: 10.1039/C5RA24947C

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