Issue 18, 2017
From the journal:

Dalton Transactions

Correction: Atomic layer deposition of Cu(i) oxide films using Cu(ii) bis(dimethylamino-2-propoxide) and water

J. R. Avila,ab   A. W. Peters,ab   Zhanyong Li,a   M. A. Ortuño,c   A. B. F. Martinson,bd   C. J. Cramer,c   J. T. Hupp*abd  and  O. K. Farha*ae  

* Corresponding authors

a Department of Chemistry, Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208, USA
E-mail: o-farha@northwestern.edu

b Argonne-Northwestern Solar Energy Research (ANSER) Center, Northwestern University, 2145 Sheridan Road, Evanston, IL 60208, USA

c Department of Chemistry, Chemical Theory Center, and Supercomputing Institute, University of Minnesota, Minneapolis, Minnesota 55455, USA

d Argonne National Laboratory, 9700 S. Cass Ave., Argonne, IL 60439, USA

e King Abdulaziz University, Faculty of Science, Department of Chemistry, Jeddah, Saudi Arabia

Abstract

Correction for ‘Atomic layer deposition of Cu(I) oxide films using Cu(II) bis(dimethylamino-2-propoxide) and water’ by J. R. Avila, et al., Dalton Trans., 2017, DOI: 10.1039/c6dt02572b.

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Article information

DOI
https://doi.org/10.1039/C7DT90077E
Article type
Correction
Submitted
24 Apr 2017
Accepted
24 Apr 2017
First published
28 Apr 2017
This article is Open Access
Creative Commons BY license

Dalton Trans., 2017,46, 6128-6128

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Correction: Atomic layer deposition of Cu(I) oxide films using Cu(II) bis(dimethylamino-2-propoxide) and water

J. R. Avila, A. W. Peters, Z. Li, M. A. Ortuño, A. B. F. Martinson, C. J. Cramer, J. T. Hupp and O. K. Farha, Dalton Trans., 2017, 46, 6128 DOI: 10.1039/C7DT90077E

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