Issue 38, 2017

Electronic imitation of behavioral and psychological synaptic activities using TiOx/Al2O3-based memristor devices

Abstract

Seeking an effective electronic synapse to emulate biological synaptic behavior is fundamental for building brain-inspired computers. An emerging two-terminal memristor, in which the conductance can be gradually modulated by external electrical stimuli, is widely considered as the strongest competitor of the electronic synapse. Here, we show the capability of TiOx/Al2O3-based memristor devices to imitate synaptic behaviors. Along with analog resistive switching performances, the devices replicate the bio-synapse behaviors of potentiation/depression, short-term-plasticity, and long-term-potentiation, which show that TiOx/Al2O3-based memristors may be useful as electronic synapses. The essential memorizing capabilities of the brain are dependent on the connection strength between neurons, and the memory types change from short-term memory to long-term memory. In the TiOx/Al2O3-based electronic synaptic junction, the memorizing levels can change their state via a standard rehearsal process and also via newly introduced process called “impact of event” i.e. the impact of pulse amplitude, and the width of the input pulse. The devices show a short-term to long-term memory effect with the introduction of intermediate mezzanine memory. The experimental achievements using the TiOx/Al2O3 electronic synapses are finally psychologically modeled by considering the mezzanine level. It is highly recommended that similar phenomena should be investigated for other memristor systems to check the authenticity of this model.

Graphical abstract: Electronic imitation of behavioral and psychological synaptic activities using TiOx/Al2O3-based memristor devices

Supplementary files

Article information

Article type
Paper
Submitted
03 Jul 2017
Accepted
05 Sep 2017
First published
06 Sep 2017

Nanoscale, 2017,9, 14442-14450

Electronic imitation of behavioral and psychological synaptic activities using TiOx/Al2O3-based memristor devices

W. Banerjee, Q. Liu, H. Lv, S. Long and M. Liu, Nanoscale, 2017, 9, 14442 DOI: 10.1039/C7NR04741J

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