Both degradation and AOX accumulation are significantly enhanced in UV/peroxymonosulfate/4-chlorophenol/Cl− system: two sides of the same coin?

Zhaohui Wang; Min Feng; Changling Fang; Ying Huang; Luoyan Ai; Fei Yang; Ying Xue; Wenqian Liu; Jianshe Liu

doi:10.1039/C7RA01294B

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Both degradation and AOX accumulation are significantly enhanced in UV/peroxymonosulfate/4-chlorophenol/Cl⁻ system: two sides of the same coin?†

Zhaohui Wang,

*^ab Min Feng,^a Changling Fang,^a Ying Huang,^a Luoyan Ai,^a Fei Yang,^a Ying Xue,^a Wenqian Liu^a and Jianshe Liu^a

Author affiliations

* Corresponding authors

^a State Environmental Protection Engineering Center for Pollution Treatment and Control in Textile Industry, College of Environmental Science and Engineering, Donghua University, Shanghai, China
E-mail: zhaohuiwang@dhu.edu.cn

^b International Centre for Balanced Land Use (ICBLU), The University of Newcastle, Callaghan, NSW 2308, Australia

Abstract

The presence of external chloride can lead to a 47-fold increment in degradation rates of 4-chlorophenol than those in the absence of chloride in UV/peroxymonosulfate process. The other side of the same coin is an undesirable accumulation and increase in absorbable organic halogen (AOX) was observed in the presence of chloride, with formation of some more toxic tetrachlorinated byproducts.

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Article information

DOI: https://doi.org/10.1039/C7RA01294B
Article type: Paper
Submitted: 31 Jan 2017
Accepted: 14 Feb 2017
First published: 21 Feb 2017
This article is Open Access

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RSC Adv., 2017,7, 12318-12321

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Both degradation and AOX accumulation are significantly enhanced in UV/peroxymonosulfate/4-chlorophenol/Cl⁻ system: two sides of the same coin?

Z. Wang, M. Feng, C. Fang, Y. Huang, L. Ai, F. Yang, Y. Xue, W. Liu and J. Liu, RSC Adv., 2017, 7, 12318 DOI: 10.1039/C7RA01294B

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