Temperature-dependent properties of monolayer MoS2 annealed in an Ar diluted S atmosphere: an experimental and first-principles study†
Abstract
In this work, the effects of annealing temperature on the structural and optical properties of monolayer MoS2 were examined in detail based on experimental and theoretical studies. The monolayer MoS2 was annealed in an argon diluted sulfur atmosphere at temperatures in the range of 800–860 °C. The annealed monolayer MoS2 showed a continuous enhancement in photoluminescence (PL) intensity with annealing temperature up to 850 °C. The mechanism of the variation in the PL properties of MoS2 was proposed to be due to the combined effects of tension release by generation of triangular pits on the MoS2 surface, and p-type doping in the monolayer MoS2. Theoretically, the formation of triangular pits with the same Mo-zz edge structure as the as-prepared MoS2 was demonstrated by first-principles calculations.