Issue 59, 2018
From the journal:

Chemical Communications

First complex oxide superconductor by atomic layer deposition†

Henrik Hovde Sønsteby, ORCID logo *a   Thomas Aarholt,b   Øystein Prytz,b   Helmer Fjellvåga  and  Ola Nilsen ORCID logo a  

* Corresponding authors

a Department of Chemistry, University of Oslo, Oslo 0315, Norway

b Centre of Materials Science and Nanotechnology, University of Oslo, Oslo 0316, Norway
E-mail: henrik.sonsteby@kjemi.uio.no

Abstract

We here report on atomic layer deposition (ALD) of the superconducting complex oxide La2−xSrxCuO4−y and provide details of the structural and electrical properties of such films. This is the first report on a complex oxide thin film with superconducting properties that has been deposited by atomic layer deposition.

Graphical abstract: First complex oxide superconductor by atomic layer deposition

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Article information

DOI
https://doi.org/10.1039/C8CC04998J
Article type
Communication
Submitted
22 Jun 2018
Accepted
03 Jul 2018
First published
03 Jul 2018

Chem. Commun., 2018,54, 8253-8256

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First complex oxide superconductor by atomic layer deposition

H. H. Sønsteby, T. Aarholt, Ø. Prytz, H. Fjellvåg and O. Nilsen, Chem. Commun., 2018, 54, 8253 DOI: 10.1039/C8CC04998J

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