Issue 8, 2018

One-step CVD fabrication and optoelectronic properties of SnS2/SnS vertical heterostructures

Abstract

Heterostructures constructed by two-dimensional (2D) material layers, which are usually prepared via a transfer/stacking method or van der Waals epitaxy, have achieved significant success in various optoelectronic devices including solar cells, light-emitting diodes and photodetectors. However, to date, most of these heterostructures comprise 2D materials with a similar crystal structure. Thus, preparation of heterostructures with different crystal structures is desirable but still a great challenge. Herein, we report a one-step CVD strategy to successfully grow SnS2/SnS vertical heterostructures on a mica substrate. Raman spectroscopy, atomic force microscopy (AFM) and transmission electron microscopy (TEM) characterizations reveal that the heterostructure is formed by stacking of pyramid-shaped SnS2 of the hexagonal structure onto the rhombus SnS flake of the orthorhombic structure. The photodetector based on the SnS2/SnS heterostructure demonstrates high optoelectronic performance: a 27.7 A W−1 photoresponsivity, 2.2 × 103 on/off ratio, less than 10 ms response time and 2.1 × 1010 jones specific detectivity. The superior performance originates from the high crystal quality of the as-grown heterostructure and its vertical device architecture. This study can expand our capability to fabricate a variety of two-dimensional heterostructures and make these heterostructures highly desirable as novel building blocks for potential applications in electronic and optoelectronic devices.

Graphical abstract: One-step CVD fabrication and optoelectronic properties of SnS2/SnS vertical heterostructures

Supplementary files

Article information

Article type
Research Article
Submitted
20 Mar 2018
Accepted
21 May 2018
First published
21 May 2018

Inorg. Chem. Front., 2018,5, 1828-1835

One-step CVD fabrication and optoelectronic properties of SnS2/SnS vertical heterostructures

M. Li, Y. Zhu, T. Li, Y. Lin, H. Cai, S. Li, H. Ding, N. Pan and X. Wang, Inorg. Chem. Front., 2018, 5, 1828 DOI: 10.1039/C8QI00251G

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements